⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL48935 | 0.82 | — | — | |
| SCHEMBL27801878 | 0.82 | — | — | |
| Methane SCHEMBL3703632 | 0.67 | — | — | |
| SCHEMBL4542496 | 0.67 | — | — | |
| SCHEMBL276330 | 0.67 | — | — | |
| Phosphine SCHEMBL23752071 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL3301669 | 0.67 | CA4 (0.33) | — | |
| SCHEMBL1257065 | 0.67 | — | — | |
| SCHEMBL10710901 | 0.67 | — | — | |
| Fluoride SCHEMBL9347415 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2596148-B1 | METHOD FOR MANUFACTURING A BARRIER COATING. | FUJIFILM MFG EUROPE BV (NL) | 2018-09-26 | — | — | EP | disclosed |
| EP-2596147-B1 | METHOD FOR MANUFACTURING A BARRIER LAYER | FUJIFILM MFG EUROPE BV (NL) | 2017-09-06 | — | — | EP | disclosed |
| US-8815750-B2 | Method for manufacturing a barrier on a sheet and a sheet for PV modules | FUJIFILM MANUFACTURING EUROPE B.V. (NL) | 2014-08-26 | — | — | US | disclosed |
| US-8815749-B2 | Method for manufacturing a barrier layer on a substrate and a multi-layer stack | FUJIFILM MANUFACTURING EUROPE B.V. (NL) | 2014-08-26 | — | — | US | disclosed |
| US-20130178060-A1 | Method for Manufacturing a Barrier Layer on a Substrate and a Multi-Layer Stack | FUJIFILM MANUFACTURING EUROPE B.V. (NL) | 2013-07-11 | — | — | US | disclosed |
| EP-2596147-A1 | METHOD FOR MANUFACTURING A BARRIER LAYER | Fujifilm Manufacturing Europe BV (NL) | 2013-05-29 | — | — | EP | disclosed |
| EP-2596148-A1 | METHOD FOR MANUFACTURING A BARRIER COATING | Fujifilm Manufacturing Europe BV (NL) | 2013-05-29 | — | — | EP | disclosed |
| US-8445897-B2 | Method for manufacturing a multi-layer stack structure with improved WVTR barrier property | FUJIFILM MANUFACTURING EUROPE B.V. (NL) | 2013-05-21 | — | — | US | disclosed |
| US-20130122719-A1 | Method for Manufacturing a Barrier on a Sheet and a Sheet for PV Modules | FUJIFILM MANUFACTURING EUROPE B.V. (NL) | 2013-05-16 | — | — | US | disclosed |
| US-8323753-B2 | Method for deposition using pulsed atmospheric pressure glow discharge | FUJIFILM MANUFACTURING EUROPE B.V. (NL) | 2012-12-04 | — | — | US | disclosed |
| EP-1371752-B1 | Layer formation method, and substrate with a layer formed by the method | KONICA CORP (JP) | 2008-05-07 | — | — | EP | disclosed |
| WO-2007139379-A1 | METHOD AND APPARATUS FOR DEPOSITION USING PULSED ATMOSPHERIC PRESSURE GLOW DISCHARGE | FUJIFILM MANUFACTURING EUROPE B.V. (NL) | 2007-12-06 | — | — | WO | disclosed |
| WO-2007091891-A1 | SHORT PULSE ATMOSPHERIC PRESSURE GLOW DISCHARGE METHOD AND APPARATUS | FUJIFILM MANUFACTURING EUROPE B.V. (NL) | 2007-08-16 | — | — | WO | disclosed |
| US-7166335-B2 | Layer formation method, and substrate with a layer formed by the method | KONICA CORPORATION (JP) | 2007-01-23 | — | — | US | disclosed |
| US-20060199014-A1 | supplying discharge gas containing nitrogen into space formed between electrodes transferring energy of excited discharge gas to film forming gas, exposing substrate to film forming gas | KONICA MINOLTA HOLDINGS, INC. (JP) | 2006-09-07 | — | — | US | disclosed |
| EP-1645657-A1 | METHOD FOR FORMING THIN FILM AND BASE HAVING THIN FILM FORMED BY SUCH METHOD | KONICA MINOLTA HOLDINGS, INC. (JP) | 2006-04-12 | — | — | EP | disclosed |
| US-20040213920-A1 | Layer formation method, and substrate with a layer formed by the method | KONICA CORPORATION (JP) | 2004-10-28 | — | — | US | disclosed |
| US-6759100-B2 | ATMOSPHERIC PRESSURE PLASMA DISCHARGE TREATMENT; CHEAP AND SAFE DISCHARGE GAS SUCH AS NITROGEN | KONICA CORPORATION (JP) | 2004-07-06 | — | — | US | disclosed |
| US-20030232136-A1 | Layer formation method, and substrate with a layer formed by the method | KONICA CORPORATION (JP) | 2003-12-18 | — | — | US | disclosed |
| EP-1371752-A2 | Layer formation method, and substrate with a layer formed by the method | KONICA CORPORATION (JP) | 2003-12-17 | — | — | EP | disclosed |