SCHEMBL4351745

SCHEMBL4351745

CC(C)CCCC1CCOC1Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4354743 0.90 PIK3CD (0.31)
SCHEMBL4358384 0.89 CDC25A (0.30)
SCHEMBL4361849 0.79
SCHEMBL4365575 0.79 EPHX1 (0.45)
SCHEMBL4360060 0.77 EPHX1 (0.53)
SCHEMBL4358910 0.76
SCHEMBL4354706 0.76 EPHX1 (0.57)
SCHEMBL4364245 0.76 EPHX1 (0.57)
SCHEMBL4351228 0.76 EPHX1 (0.57)
SCHEMBL4357673 0.76 EPHX1 (0.57)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090035702-A1 PROCESS FOR PRODUCING COMPOUND HAVING ACID-LABILE GROUP KYOWA HAKKO CHEMICAL CO., LTD. (JP) 2009-02-05 US disclosed
US-20060177763-A1 Method for producing compound having acid-labile group KYOWA HAKKO CHEMICAL CO., LTD. (JP) 2006-08-10 US disclosed
EP-1661918-A1 METHOD FOR PRODUCING COMPOUND HAVING ACID-LABILE GROUP Kyowa Hakko Chemical Co., Ltd. (JP) 2006-05-31 EP disclosed