SCHEMBL4353273

SCHEMBL4353273

FC(F)(F)C1C=CCC=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4358332 0.77
SCHEMBL6520634 0.75
SCHEMBL4362388 0.71
SCHEMBL4350760 0.69
SCHEMBL4356518 0.67
SCHEMBL4352590 0.65
SCHEMBL16162898 0.65
SCHEMBL9934657 0.62
SCHEMBL4353625 0.62
SCHEMBL13816315 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107473950-B Two (trifluoromethyl) -2,5- cyclohexadiene -1- ketone of 4- fragrance methylene -2,6- and preparation and application 北京博诺安科科技有限公司 2019-02-15 CN disclosed
CN-107473950-A 4 fragrant methylenes 2,6 2(Trifluoromethyl)The ketone of 2,5 cyclohexadiene 1 and preparation and application 北京博诺安科科技有限公司 2017-12-15 CN disclosed
US-8487071-B2 Polyether polymer and production process thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-16 US disclosed
US-20110065889-A1 POLYETHER POLYMER AND PRODUCTION PROCESS THEREOF SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
WO-2009142094-A1 POLYETHER POLYMER AND PRODUCTION PROCESS THEREOF SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-11-26 WO disclosed