⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4365683 | 1.00 | — | — | |
| SCHEMBL4357370 | 1.00 | — | — | |
| SCHEMBL4357254 | 1.00 | — | — | |
| SCHEMBL4361349 | 1.00 | — | — | |
| SCHEMBL9650236 | 1.00 | — | — | |
| SCHEMBL4361099 | 1.00 | — | — | |
| SCHEMBL4365250 | 0.95 | — | — | |
| SCHEMBL816182 | 0.95 | — | — | |
| SCHEMBL118 | 0.95 | — | — | |
| SCHEMBL6519428 | 0.95 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 134 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4372026-A2 | POLYMERIC BINDER AND ALL-SOLID-STATE SECONDARY BATTERY | Teijin Limited (JP) | 2024-05-22 | — | — | EP | disclosed |
| CN-113527101-B | Novel compound, polymer, process for producing the same, photosensitive resin composition, pattern forming process, cured film, and electronic component | 信越化学工业株式会社 | 2024-04-23 | — | — | CN | disclosed |
| CN-117343025-A | Polymerizable liquid crystal compound, polymerizable composition, retardation film, transfer laminate, and optical member | 大日本印刷株式会社 | 2024-01-05 | — | — | CN | disclosed |
| EP-3896114-B1 | POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHINETSU CHEMICAL CO (JP) | 2023-10-18 | — | — | EP | disclosed |
| CN-111201220-B | Polymerizable liquid crystal compound, polymerizable composition, retardation film, transfer laminate, and optical member | 大日本印刷株式会社 | 2023-10-17 | — | — | CN | disclosed |
| US-20230137250-A1 | POLYMERIZABLE LIQUID CRYSTAL COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, RETARDATION FILM, METHOD FOR PRODUCING RETARDATION FILM, TRANSFER LAMINATE, OPTICAL MEMBER, METHOD FOR PRODUCING OPTICAL MEMBER, AND DISPLAY DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| US-11572442-B2 | Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2023-02-07 | — | — | US | disclosed |
| US-11560518-B2 | Polymerizable liquid crystal compound, polymerizable composition, polymer, retardation film, method for producing retardation film, transfer laminate, optical member, method for producing optical member, and display device | DAI NIPPON PRINTING CO., LTD. (JP) | 2023-01-24 | — | — | US | disclosed |
| EP-3415911-B1 | ANALYSIS PLATE, ANALYSIS METHOD, AND METHOD OF MANUFACTURING ANALYSIS PLATE | ZEON CORP (JP) | 2022-12-14 | — | — | EP | disclosed |
| CN-109564322-B | Identification display medium and method for manufacturing same | 日本瑞翁株式会社 | 2022-08-02 | — | — | CN | disclosed |
| EP-2910579-A1 | POLYMERIZABLE COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, AND OPTICALLY ANISOTROPIC SUBSTANCE | Zeon Corporation (JP) | 2015-08-26 | — | — | EP | disclosed |
| US-20150175564-A1 | POLYMERIZABLE COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, OPTICALLY ANISOTROPIC BODY, AND METHOD FOR PRODUCING POLYMERIZABLE COMPOUND | ZEON CORPORATION (JP) | 2015-06-25 | — | — | US | disclosed |
| EP-2871192-A1 | POLYMERIZABLE COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, OPTICALLY ANISOTROPIC BODY, AND METHOD FOR PRODUCING POLYMERIZABLE COMPOUND | Zeon Corporation (JP) | 2015-05-13 | — | — | EP | disclosed |
| US-8859183-B2 | N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition | KURARAY CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8753794-B2 | N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition | KURARAY CO., LTD. (JP) | 2014-06-17 | — | — | US | disclosed |
| US-20140038106-A1 | N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2014-02-06 | — | — | US | disclosed |
| US-8487071-B2 | Polyether polymer and production process thereof | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-07-16 | — | — | US | disclosed |
| US-20120148954-A1 | N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20110065889-A1 | POLYETHER POLYMER AND PRODUCTION PROCESS THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| WO-2009142094-A1 | POLYETHER POLYMER AND PRODUCTION PROCESS THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-11-26 | — | — | WO | disclosed |