Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19811669 | 0.97 | TSHR (0.30) | TSHRTDP1 | |
| SCHEMBL19811502 | 0.97 | TSHR (0.30) | TSHRTDP1 | |
| Ammonia Solution, Strong SCHEMBL19811145 | 0.97 | TSHR (0.30) | TSHRTDP1 | |
| SCHEMBL19811732 | 0.97 | TSHR (0.30) | TSHRTDP1 | |
| SCHEMBL19811956 | 0.97 | TSHR (0.30) | TSHRTDP1 | |
| SCHEMBL19811447 | 0.97 | TSHR (0.30) | TSHRTDP1 | |
| SCHEMBL19811534 | 0.97 | TSHR (0.30) | TSHRTDP1 | |
| SCHEMBL19811404 | 0.97 | TSHR (0.30) | TSHRTDP1 | |
| SCHEMBL19811658 | 0.97 | TSHR (0.30) | TSHRTDP1 | |
| Ammonia Solution, Strong SCHEMBL19811018 | 0.95 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9901912-B2 | Super acids and bases as dehydrocondensation catalysts | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2018-02-27 | — | — | US | claimed |
| CN-107209146-B | Electrochemical gas sensor and electrolyte for electrochemical gas sensor | 德尔格安全股份两合公司 | 2024-03-12 | — | — | CN | disclosed |
| WO-2024048464-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | 富士フイルム株式会社 | 2024-03-07 | — | — | WO | disclosed |
| WO-2024024844-A1 | METHOD FOR PRODUCING ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING ONIUM SALT COMPOUND FOR ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ONIUM SALT COMPOSITION | 富士フイルム株式会社 | 2024-02-01 | — | — | WO | disclosed |
| WO-2024024669-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | 富士フイルム株式会社 | 2024-02-01 | — | — | WO | disclosed |
| WO-2024024691-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN-FORMING METHOD, AND PRODUCTION METHOD FOR ELECTRONIC DEVICE | 富士フイルム株式会社 | 2024-02-01 | — | — | WO | disclosed |
| WO-2024004790-A1 | ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD | 富士フイルム株式会社 | 2024-01-04 | — | — | WO | disclosed |
| WO-2023243521-A1 | ACTINIC LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2023-12-21 | — | — | WO | disclosed |
| WO-2023218970-A1 | ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2023-11-16 | — | — | WO | disclosed |
| CN-113252759-A | Electrochemical gas sensor and electrolyte for electrochemical gas sensor | 德尔格安全股份两合公司 | 2021-08-13 | — | — | CN | disclosed |
| US-20200326299-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2020-10-15 | — | — | US | disclosed |
| US-10732144-B2 | Electrochemical gas sensor and electrolyte for an electrochemical gas sensor | Dräger Safety AG & Co. KGaA (DE) | 2020-08-04 | — | — | US | disclosed |
| US-20180031516-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2018-02-01 | — | — | US | disclosed |
| EP-2602814-A1 | ELECTRONIC COMPONENT MANUFACTURING METHOD | Nitto Denko Corporation (JP) | 2013-06-12 | — | — | EP | disclosed |
| US-20090087740-A1 | NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY | PANASONIC CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |