⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Iodide SCHEMBL29025921 | 0.95 | — | — | |
| Bromide SCHEMBL20500209 | 0.95 | — | — | |
| SCHEMBL8432771 | 0.91 | — | — | |
| SCHEMBL8428944 | 0.78 | — | — | |
| SCHEMBL15449794 | 0.74 | — | — | |
| SCHEMBL25219603 | 0.70 | — | — | |
| SCHEMBL12815705 | 0.70 | — | — | |
| SCHEMBL25264432 | 0.70 | — | — | |
| SCHEMBL2271926 | 0.70 | — | — | |
| SCHEMBL9970793 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 598 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117682791-B | Air hole improver and preparation method and application thereof | 北京建筑材料科学研究总院有限公司 | 2026-05-19 | — | — | CN | claimed |
| CN-117209200-B | Nano calcium silicate hydrate crystal nucleus early strength agent and preparation method and application thereof | 北京建筑材料科学研究总院有限公司 | 2026-05-12 | — | — | CN | claimed |
| CN-119297235-A | Silicon-carbon negative electrode material and preparation method thereof by adopting low-temperature silicon-carbon deposition mode | 苏州纽姆特纳米科技有限公司 | 2025-01-10 | — | — | CN | claimed |
| CN-118063167-A | Heat-insulating freeze-resistant waterproof mortar and preparation method thereof | 吕保锋 | 2024-05-24 | — | — | CN | claimed |
| CN-117913450-A | Flexible hydrophobic silica-polyimide aerogel diaphragm and preparation method thereof | 中南大学 | 2024-04-19 | — | — | CN | claimed |
| CN-117682791-A | Air hole improver and preparation method and application thereof | 北京建筑材料科学研究总院有限公司 | 2024-03-12 | — | — | CN | claimed |
| CN-117293018-A | Pretreatment method for improving continuity of ultrathin amorphous silicon film on silicon oxide | 应用材料公司 | 2023-12-26 | — | — | CN | claimed |
| CN-117209200-A | Nano calcium silicate hydrate crystal nucleus early strength agent and preparation method and application thereof | 北京建筑材料科学研究总院有限公司 | 2023-12-12 | — | — | CN | claimed |
| CN-110419093-B | Treatment method for improving film roughness by improving nucleation/adhesion of silicon oxide | 应用材料公司 | 2023-12-01 | — | — | CN | claimed |
| CN-114341072-B | Textured glass articles and methods of making the same | 康宁股份有限公司 | 2023-11-14 | — | — | CN | claimed |
| EP-1539861-A1 | PROCESS FOR THE PREPARATION OF POLYORGANOSILYLATED CARBOXYLATE MONOMERS OR POLYMERS THEREOF | Sigmakalon Services B.V. (NL) | 2005-06-15 | — | — | EP | claimed |
| WO-2004007591-A1 | PROCESS FOR THE PREPARATION OF POLYORGANOSILYLATED CARBOXYLATE MONOMERS OR POLYMERS THEREOF | SIGMAKALON SERVICES B.V. (NL) | 2004-01-22 | — | — | WO | claimed |
| US-6524974-B1 | FORMATION OF IMPROVED LOW DIELECTRIC CONSTANT CARBON-CONTAINING SILICON OXIDE DIELECTRIC MATERIAL BY REACTION OF CARBON-CONTAINING SILANE WITH OXIDIZING AGENT IN THE PRESENCE OF ONE OR MORE REACTION RETARDANTS | LSI LOGIC CORPORATION | 2003-02-25 | — | — | US | claimed |
| WO-2003015129-A2 | LOW-K DIELECTRIC THIN FILMS AND CHEMICAL VAPOR DEPOSITION METHOD OF MAKING SAME | ADVANCED TECHNOLOGY MATERIAL, INC. (US) | 2003-02-20 | — | — | WO | claimed |
| US-6303047-B1 | Low dielectric constant multiple carbon-containing silicon oxide dielectric material for use in integrated circuit structures, and method of making same | LSI LOGIC CORPORATION | 2001-10-16 | — | — | US | claimed |
| EP-1039520-A2 | Low dielectric constant carbon-containing silicon oxide dielectric material for use in integrated circuit structures | LSI LOGIC CORPORATION (US) | 2000-09-27 | — | — | EP | claimed |
| EP-1039521-A2 | Formation of improved low dielectric constant carbon-containing silicon oxide dielectric material by reaction of carbon-containing silane with oxidising agent in the presence of one or more reaction retardants | LSI LOGIC CORPORATION (US) | 2000-09-27 | — | — | EP | claimed |
| US-5654459-A | VIA COMPROPORTIONATION OF ALKYLCHLOROSILANES WITH HYDROGENCHLOROSILANES IN THE PRESENCE OF A ZIRCONIUM AND/OR ALUMINUM CATALYST SATURATED WITH A HYDROGEN HALIDE; HIGH YIELD AND PURITY | HUELS AKTIENGESELLSCHAFT (DE) | 1997-08-05 | — | — | US | claimed |
| US-5650004-A | SILICONE TREATED POWDER, POZZALANIC FILLER, PORTLAND CEMENT, CRUSHED AGGREGATE; WATER REPELLENT COATING FOR PLASTERING A SWIMMING POOL SURFACE | YON MICHAEL D (US) | 1997-07-22 | — | — | US | claimed |
| CN-1063064-A | The surface treatment method of conductive copper powder | BEIJING PRINTING TECH INST (CN) | 1992-07-29 | — | — | CN | claimed |