SCHEMBL4366080

SCHEMBL4366080

CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C.COC(=O)C(C)(C)N=NC(C)(C)C(=O)OC

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
MMP8 P22894 1/20 0.33
CTSS P25774 1/20 0.30
CTSK P43235 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30887376 0.82
SCHEMBL30270392 0.79
Methyl Alcohol SCHEMBL27889911 0.79
Hydrogen Peroxide SCHEMBL11529670 0.79
SCHEMBL14898 0.79
SCHEMBL27970435 0.79
SCHEMBL14897 0.79
SCHEMBL26739247 0.79
Hydrochloric Acid SCHEMBL9811927 0.77
Hydrochloric Acid SCHEMBL9811924 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7618763-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-17 US disclosed
US-20070105042-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-10 US disclosed