SCHEMBL436622

SCHEMBL436622

C=CCOCC[Si](CCOCC=C)(OC)OC

nearest known ligand 0.42

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.42
POLB P06746 1/20 0.42
KMT2A Q03164 1/20 0.42
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
CA9 Q16790 1/20 0.30
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL433193 0.82 MEN1 (0.42) MEN1POLBKMT2ACA1CA2
SCHEMBL435646 0.82 MEN1 (0.42) MEN1POLBKMT2ACA1CA2
SCHEMBL435793 0.78 MEN1 (0.44) MEN1POLBKMT2A
SCHEMBL10593171 0.76 MEN1 (0.45) MEN1POLBKMT2ACA1CA2
SCHEMBL961357 0.74 MEN1 (0.39) MEN1POLBKMT2A
SCHEMBL28850588 0.73 MEN1 (0.36) MEN1POLBKMT2A
SCHEMBL960776 0.72 MEN1 (0.38) MEN1POLBKMT2AALDH1A1
SCHEMBL985365 0.71 MEN1 (0.37) MEN1POLBKMT2A
SCHEMBL153914 0.71 POLB (0.52) MEN1POLBKMT2ACA1CA2
SCHEMBL1057260 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8101703-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polyimide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD (TW) 2012-01-24 US claimed
US-20100297455-A1 PRECURSOR SOLUTION FOR POLYIMIDE/SILICA COMPOSITE MATERIAL, ITS MANUFACTURE METHOD, AND POLYIMIDE/SILICA COMPOSITE MATERIAL HAVING LOW VOLUME SHRINKAGE ETERNAL CHEMICAL CO., LTD. 2010-11-25 US claimed
US-7790828-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. (CN) 2010-09-07 US claimed
US-20050245715-A1 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. 2005-11-03 US claimed
US-8101703-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polyimide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD (TW) 2012-01-24 US disclosed
US-20100297455-A1 PRECURSOR SOLUTION FOR POLYIMIDE/SILICA COMPOSITE MATERIAL, ITS MANUFACTURE METHOD, AND POLYIMIDE/SILICA COMPOSITE MATERIAL HAVING LOW VOLUME SHRINKAGE ETERNAL CHEMICAL CO., LTD. 2010-11-25 US disclosed
US-7790828-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. (CN) 2010-09-07 US disclosed
US-20050245715-A1 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. 2005-11-03 US disclosed