SCHEMBL4370896

SCHEMBL4370896

CO[Ti](OC)(OC)C1=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1818646 0.80
SCHEMBL27636311 0.79
SCHEMBL28552868 0.79 CA4 (0.34)
SCHEMBL27507796 0.78
SCHEMBL27680391 0.78
SCHEMBL8090653 0.78
Hydrochloric Acid SCHEMBL4524547 0.76
SCHEMBL7925557 0.73
SCHEMBL8384358 0.73
SCHEMBL9573673 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111742430-A Core-shell nanoparticles and their use in electrochemical cells 新加坡科技研究局 2020-10-02 CN claimed
EP-3178808-B1 ALKOXIDE COMPOUND, THIN FILM-FORMING STARTING MATERIAL, THIN FILM FORMATION METHOD AND ALCOHOL COMPOUND ADEKA CORP (JP) 2024-11-06 EP disclosed
US-11618762-B2 Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound ADEKA CORPORATION (JP) 2023-04-04 US disclosed
CN-114424676-A Ultra-thin conformal coatings for static dissipation in semiconductor processing tools 应用材料公司 2022-04-29 CN disclosed
US-20220017554-A1 COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR MANUFACTURING THIN FILM, AND AMIDINE COMPOUND ADEKA CORPORATION (JP) 2022-01-20 US disclosed
US-11161867-B2 Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound ADEKA CORPORATION (JP) 2021-11-02 US disclosed
EP-3505511-B1 DIAZADIENYL COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, AND METHOD FOR PRODUCING THIN FILM ADEKA CORP (JP) 2021-05-26 EP disclosed
US-10920313-B2 Diazadienyl compound, raw material for forming thin film, and method for manufacturing thin film ADEKA CORPORATION (JP) 2021-02-16 US disclosed
US-10882874-B2 Vanadium compound ADEKA CORPORATION (JP) 2021-01-05 US disclosed
CN-111742430-A Core-shell nanoparticles and their use in electrochemical cells 新加坡科技研究局 2020-10-02 CN disclosed
US-5914375-A Catalyst composition for preparing high-syndiotactivity polystyrene from styrene or other aryl ethylene monomers and processes using the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 1999-06-22 US disclosed
EP-0775712-B1 Improved catalyst composition for preparing high-syndiotacticity polystyrene from styrene or other aryl ethylene monomers and processes using the same IND TECH RES INST (TW) 1999-04-28 EP disclosed
US-5644009-A Catalyst composition for preparing high syndiotacticity polystyrene from styrene of other arylethylene monomers and processes using the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 1997-07-01 US disclosed
EP-0775712-A1 Improved catalyst composition for preparing high-syndiotacticity polystyrene from styrene or other aryl ethylene monomers and processes using the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 1997-05-28 EP disclosed
EP-0609439-B1 PROCESS FOR PRODUCING POLYOLEFIN IDEMITSU PETROCHEMICAL CO (JP) 1996-11-27 EP disclosed
EP-0609439-A1 PROCESS FOR PRODUCING POLYOLEFIN IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1994-08-10 EP disclosed
EP-0598134-A1 PROCESS FOR PRODUCING POLYOLEFIN IDEMITSU KOSAN COMPANY LIMITED (JP) 1994-05-25 EP disclosed
EP-0571987-A2 Process for producing an ethylenic polymer composition IDEMITSU KOSAN COMPANY LIMITED (JP) 1993-12-01 EP disclosed
EP-0572003-A2 Process for producing an ethylenic polymer composition IDEMITSU KOSAN COMPANY LIMITED (JP) 1993-12-01 EP disclosed
EP-0572034-A2 Ethylenic copolymer and ethylenic copolymer composition IDEMITSU KOSAN COMPANY LIMITED (JP) 1993-12-01 EP disclosed