⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28640167 | 0.89 | — | — | |
| SCHEMBL27548494 | 0.87 | — | — | |
| SCHEMBL15399 | 0.87 | — | — | |
| SCHEMBL2286219 | 0.87 | — | — | |
| SCHEMBL11323442 | 0.87 | — | — | |
| Methyl Alcohol SCHEMBL1358030 | 0.82 | — | — | |
| SCHEMBL25282004 | 0.75 | — | — | |
| Hydrochloric Acid SCHEMBL503677 | 0.75 | — | — | |
| SCHEMBL972425 | 0.75 | — | — | |
| Hydrochloric Acid SCHEMBL6519232 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4743429-A1 | REFRACTORY COMPOSITIONS | ImerTech SAS (FR) | 2026-05-20 | — | — | EP | claimed |
| WO-2025012174-A1 | REFRACTORY COMPOSITIONS | IMERTECH SAS (FR) | 2025-01-16 | — | — | WO | claimed |
| EP-4491600-A1 | REFRACTORY COMPOSITIONS | ImerTech SAS (FR) | 2025-01-15 | — | — | EP | claimed |
| CN-116606156-A | Graphene/rare earth composite aerogel material, preparation method thereof and nuclear reactor heat insulation material | 中广核研究院有限公司 | 2023-08-18 | — | — | CN | claimed |
| CN-110128115-A | A kind of method that flash burning prepares oxide eutectic ceramics | 西南交通大学 | 2019-08-16 | — | — | CN | claimed |
| US-7608335-B2 | Near single-crystalline, high-carrier-mobility silicon thin film on a polycrystalline/amorphous substrate | LOS ALAMOS NATIONAL SECURITY, LLC (US) | 2009-10-27 | — | — | US | claimed |
| WO-2006060466-A2 | NEAR SINGLE-CRYSTALLINE, HIGH-CARRIER-MOBILITY SILICON THIN FILM ON A POLYCRYSTALLINE/AMORPHOUS SUBSTRATE | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2006-06-08 | — | — | WO | claimed |
| US-20060115964-A1 | Near single-crystalline, high-carrier-mobility silicon thin film on a polycrystalline/amorphous substrate | LOS ALAMOS NATIONAL SECURITY, LLC | 2006-06-01 | — | — | US | claimed |
| CN-1215196-C | Laminated film and method of forming film | SUMITOMO ELECTRIC INDUSTRIES (JP) | 2005-08-17 | — | — | CN | claimed |
| CN-1492940-A | Laminated film and method of forming film | ס�ѵ�����ҵ��ʽ���� | 2004-04-28 | — | — | CN | claimed |
| EP-4743429-A1 | REFRACTORY COMPOSITIONS | ImerTech SAS (FR) | 2026-05-20 | — | — | EP | disclosed |
| US-20260120929-A1 | SUPERCONDUCTING COIL DEVICE, SUPERCONDUCTING COIL, AND MAGNETIC RESONANCE IMAGING DEVICE | CANON MEDICAL SYSTEMS CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| CN-121824131-A | High-flame-retardance silicon nitride composite refractory material and preparation method thereof | 辽宁科技学院 | 2026-04-10 | — | — | CN | disclosed |
| WO-2025012174-A1 | REFRACTORY COMPOSITIONS | IMERTECH SAS (FR) | 2025-01-16 | — | — | WO | disclosed |
| EP-4491600-A1 | REFRACTORY COMPOSITIONS | ImerTech SAS (FR) | 2025-01-15 | — | — | EP | disclosed |
| CN-1215196-C | Laminated film and method of forming film | SUMITOMO ELECTRIC INDUSTRIES (JP) | 2005-08-17 | — | — | CN | disclosed |
| US-6887588-B2 | Article protected by thermal barrier coating having a sintering inhibitor, and its fabrication | GENERAL ELECTRIC COMPANY (US) | 2005-05-03 | — | — | US | disclosed |
| CN-1492940-A | Laminated film and method of forming film | ס�ѵ�����ҵ��ʽ���� | 2004-04-28 | — | — | CN | disclosed |
| US-20030059633-A1 | Article protected by thermal barrier coating having a sintering inhibitor, and its fabrication | GENERAL ELECTRIC COMPANY | 2003-03-27 | — | — | US | disclosed |
| EP-1295965-A2 | Article protected by thermal barrier coating having a sintering inhibitor, and its fabrication | General Electric Company (US) | 2003-03-26 | — | — | EP | disclosed |