SCHEMBL437211

SCHEMBL437211

C/C=C(/C)OCCCN(CCC)CCC

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 1/20 0.39
HTR1A P08908 2/20 0.37
LMNA P02545 1/20 0.37
CYP1A2 P05177 1/20 0.37
CHRM2 P08172 1/20 0.37
CYP3A4 P08684 1/20 0.37
GAA P10253 1/20 0.37
CYP2D6 P10635 1/20 0.37
DRD3 P35462 1/20 0.37
SCN1A P35498 1/20 0.37
SLC6A3 Q01959 1/20 0.37
KCNH2 Q12809 1/20 0.37
SCN2A Q99250 1/20 0.37
SCN3A Q9NY46 1/20 0.37
ALDH1A1 P00352 1/20 0.34
BCHE P06276 4/20 0.34
ACHE P22303 4/20 0.34
FDPS P14324 1/20 0.33
ATM Q13315 1/20 0.32
MAOA P21397 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL438116 0.86 SCN1A (0.39) KMT2AHTR1ALMNACYP1A2CHRM2
SCHEMBL434173 0.85 KMT2A (0.38) KMT2AHTR1ALMNACYP1A2CHRM2
SCHEMBL434172 0.78 KMT2A (0.38) KMT2AHTR1ALMNACYP1A2CHRM2
SCHEMBL891193 0.78
SCHEMBL17742282 0.78
SCHEMBL7129880 0.78
SCHEMBL435799 0.77 GAA (0.40) LMNACHRM2GAAALDH1A1TSHR
SCHEMBL14782100 0.73
SCHEMBL7132550 0.73
SCHEMBL891861 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8101703-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polyimide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD (TW) 2012-01-24 US claimed
US-20100297455-A1 PRECURSOR SOLUTION FOR POLYIMIDE/SILICA COMPOSITE MATERIAL, ITS MANUFACTURE METHOD, AND POLYIMIDE/SILICA COMPOSITE MATERIAL HAVING LOW VOLUME SHRINKAGE ETERNAL CHEMICAL CO., LTD. 2010-11-25 US claimed
US-7790828-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. (CN) 2010-09-07 US claimed
US-20050245715-A1 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. 2005-11-03 US claimed
US-8101703-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polyimide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD (TW) 2012-01-24 US disclosed
US-20100297455-A1 PRECURSOR SOLUTION FOR POLYIMIDE/SILICA COMPOSITE MATERIAL, ITS MANUFACTURE METHOD, AND POLYIMIDE/SILICA COMPOSITE MATERIAL HAVING LOW VOLUME SHRINKAGE ETERNAL CHEMICAL CO., LTD. 2010-11-25 US disclosed
US-7790828-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. (CN) 2010-09-07 US disclosed
US-20050245715-A1 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. 2005-11-03 US disclosed