SCHEMBL4373736

SCHEMBL4373736

CCN(CC)[Ta](N(CC)CC)(N(CC)CC)N(CC)CC

nearest known ligand 0.30

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ABCB11 O95342 1/20 0.30
CYP2E1 P05181 1/20 0.30
PTGS1 P23219 1/20 0.30
HTT P42858 1/20 0.30
GSDMD P57764 1/20 0.30
CA12 O43570 1/20 0.30
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
CA4 P22748 1/20 0.30
CA9 Q16790 1/20 0.30
EHMT2 Q96KQ7 1/20 0.30
EHMT1 Q9H9B1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6246304 0.81
SCHEMBL30396258 0.73
SCHEMBL28757557 0.67
SCHEMBL5032549 0.61
SCHEMBL1200083 0.58
SCHEMBL3454340 0.57
Water SCHEMBL29009194 0.57
SCHEMBL42413 0.55
SCHEMBL20658149 0.55 TSHR (0.33)
Propane SCHEMBL11076973 0.54

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1409766-A1 SYSTEMS AND METHODS FOR DELIVERING AN ULTRAPURE CHEMICAL L'Air Liquide S. A. à Directoire et Conseil de Surveillance pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2004-04-21 EP claimed
WO-2003012163-A2 INTEGRAL BLOCKS, CHEMICAL DELIVERY SYSTEMS AND METHODS FOR DELIVERING AN ULTRAPURE CHEMICAL L'AIR LIQUIDE-SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (US) 2003-02-13 WO claimed
US-20030012709-A1 Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical AMERICAN AIR LIQUIDE, INC. 2003-01-16 US claimed
US-20020192952-A1 Plasma treatment of tantalum nitride compound films formed by chemical vapor deposition APPLIED MATERIALS, INC. 2002-12-19 US claimed
US-6455421-B1 Plasma treatment of tantalum nitride compound films formed by chemical vapor deposition APPLIED MATERIALS, INC. 2002-09-24 US claimed
EP-1179843-A2 Plasma treatment of tantalum nitride compound films formed by chemical vapor deposition Applied Materials, Inc. (US) 2002-02-13 EP claimed
EP-2902396-A1 Novel dithiocarbamate tantalum organic precursors and their use for vapor phase deposition of tantalum containing films L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2015-08-05 EP disclosed
US-20140117302-A1 Phase Change Memory Cells, Methods Of Forming Phase Change Memory Cells, And Methods Of Forming Heater Material For Phase Change Memory Cells MICRON TECHNOLOGY, INC. (US) 2014-05-01 US disclosed
EP-1409766-B1 SYSTEM FOR DELIVERING AN ULTRAPURE CHEMICAL AIR LIQUIDE (FR) 2009-08-26 EP disclosed
US-7334708-B2 Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2008-02-26 US disclosed
EP-1409766-A1 SYSTEMS AND METHODS FOR DELIVERING AN ULTRAPURE CHEMICAL L'Air Liquide S. A. à Directoire et Conseil de Surveillance pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2004-04-21 EP disclosed
WO-2003026005-A2 FORMATION OF REFRACTORY METAL NITRIDES USING CHEMISORPTION TECHNIQUES APPLIED MATERIALS, INC. (US) 2003-03-27 WO disclosed
US-20030049931-A1 Formation of refractory metal nitrides using chemisorption techniques APPLIED MATERIALS, INC. 2003-03-13 US disclosed
WO-2003012163-A2 INTEGRAL BLOCKS, CHEMICAL DELIVERY SYSTEMS AND METHODS FOR DELIVERING AN ULTRAPURE CHEMICAL L'AIR LIQUIDE-SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (US) 2003-02-13 WO disclosed
US-20030012709-A1 Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical AMERICAN AIR LIQUIDE, INC. 2003-01-16 US disclosed
US-20020192952-A1 Plasma treatment of tantalum nitride compound films formed by chemical vapor deposition APPLIED MATERIALS, INC. 2002-12-19 US disclosed
US-6455421-B1 Plasma treatment of tantalum nitride compound films formed by chemical vapor deposition APPLIED MATERIALS, INC. 2002-09-24 US disclosed
EP-1179843-A2 Plasma treatment of tantalum nitride compound films formed by chemical vapor deposition Applied Materials, Inc. (US) 2002-02-13 EP disclosed