SCHEMBL437418

SCHEMBL437418

C[C@@H]1CCCC[C@@H]1O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL409660 1.00
SCHEMBL763375 1.00
SCHEMBL8240958 1.00
SCHEMBL182659 1.00
SCHEMBL8216954 1.00
SCHEMBL43021 1.00
SCHEMBL409821 1.00
SCHEMBL439312 1.00
SCHEMBL23723798 0.97
SCHEMBL4839004 0.97 CA1 (0.94)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 181 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117683394-A Nanoparticle ink, preparation method thereof and electroluminescent device 广东聚华印刷显示技术有限公司 2024-03-12 CN claimed
CN-117683395-A Preservation method of nano material, ink, preparation method of ink and electroluminescent device 广东聚华印刷显示技术有限公司 2024-03-12 CN claimed
CN-108795153-B Purification method of zinc oxide-based nanoparticle ink 深圳TCL工业研究院有限公司 2021-05-14 CN claimed
CN-109148707-B Preparation method of zinc oxide-based nanoparticle stable dispersion liquid 苏州大学 2021-03-12 CN claimed
US-10119211-B2 Binder composition for mineral wool SAINT-GOBAIN ISOVER (FR) 2018-11-06 US claimed
EP-2762976-A1 Use of immersion liquids AIR PRODUCTS AND CHEMICALS, INC. (US) 2014-08-06 EP claimed
US-8007986-B2 Immersion lithography fluids AIR PRODUCTS AND CHEMICALS, INC. (US) 2011-08-30 US claimed
US-7879531-B2 Immersion lithography fluids AIR PRODUCTS AND CHEMICALS, INC. (US) 2011-02-01 US claimed
US-20070229795-A1 Immersion Lithography Fluids AIR PRODUCTS AND CHEMICALS, INC. (US) 2007-10-04 US claimed
JP-3900205-B2 2007-04-04 JP claimed
US-20050173682-A1 carrier medium and at least one additive such as alkyl polyglycoside, alkyl alcohol, or various ethylene oxide adducts; use at an operating wavelength ranging from 140 nm to 365 nm AIR PRODUCTS AND CHEMICALS, INC. 2005-08-11 US claimed
US-20050161644-A1 carrier medium and at least one additive such as alkyl polyglycoside, alkyl alcohol, or various ethylene oxide adducts; use at an operating wavelength ranging from 140 nm to 248 nm, and a refractive index greater than water at an operating wavelength AIR PRODUCTS AND CHEMICALS, INC. 2005-07-28 US claimed
EP-1557721-A2 Immersion lithography fluids AIR PRODUCTS AND CHEMICALS, INC. (US) 2005-07-27 EP claimed
EP-0885318-B1 FLASH SPINNING PROCESS AND PRODUCTS DU PONT (US) 2001-06-13 EP claimed
JP-2000506231-A 2000-05-23 JP claimed
US-5959960-A Method of providing a range of conformalities for optical recording layers EASTMAN KODAK COMPANY (US) 1999-09-28 US claimed
EP-0885318-A1 FLASH SPINNING PROCESS AND PRODUCTS E.I. DU PONT DE NEMOURS & COMPANY INCORPORATED (US) 1998-12-23 EP claimed
EP-0833316-A2 A method of providing a range of conformalities for optical recording layers EASTMAN KODAK COMPANY (US) 1998-04-01 EP claimed
US-5723084-A Flash spinning process E. I. DU PONT DE NEMOURS AND COMPANY (US) 1998-03-03 US claimed
WO-1997033021-A1 FLASH SPINNING PROCESS AND PRODUCTS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1997-09-12 WO claimed