⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6709774 | 0.67 | — | — | |
| SCHEMBL19018527 | 0.67 | — | — | |
| SCHEMBL9596247 | 0.67 | — | — | |
| SCHEMBL2937685 | 0.63 | TSHR (0.32) | — | |
| SCHEMBL3072438 | 0.63 | — | — | |
| SCHEMBL17917436 | 0.62 | — | — | |
| SCHEMBL19732447 | 0.62 | — | — | |
| SCHEMBL14788450 | 0.61 | TSHR (0.59) | — | |
| SCHEMBL12862838 | 0.60 | TSHR (0.31) | — | |
| SCHEMBL18610996 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210292478-A1 | PROCESS FOR PRODUCING POLYOL | COVESTRO INTELLECTUAL PROPERTY GMBH & CO. KG (DE) | 2021-09-23 | — | — | US | claimed |
| EP-3824013-A1 | HETEROCYCLIC FUNCTIONAL POLYETHERS OR POLYETHERCARBONATES AND METHOD FOR THE PRODUCTION THEREOF | Covestro Intellectual Property GmbH & Co. KG (DE) | 2021-05-26 | — | — | EP | claimed |
| CN-112513139-A | Heterocyclic functional polyethers or polyether carbonates and method for the production thereof | 科思创知识产权两合公司 | 2021-03-16 | — | — | CN | claimed |
| WO-2020016201-A1 | HETEROCYCLIC FUNCTIONAL POLYETHERS OR POLYETHERCARBONATES AND METHOD FOR THE PRODUCTION THEREOF | COVESTRO DEUTSCHLAND AG (DE) | 2020-01-23 | — | — | WO | claimed |
| EP-3597690-A1 | HETEROCYCLE-FUNCTIONAL POLYETHER OR POLYETHER CARBONATES AND METHOD FOR THEIR MANUFACTURE | Covestro Deutschland AG (DE) | 2020-01-22 | — | — | EP | claimed |
| CN-107148690-A | Method for preparing positive active material and positive active material prepared according to the method | ECOPRO BM 有限公司 | 2017-09-08 | — | — | CN | claimed |
| JP-5148280-A | — | — | None | — | — | JP | disclosed |
| US-20210292478-A1 | PROCESS FOR PRODUCING POLYOL | COVESTRO INTELLECTUAL PROPERTY GMBH & CO. KG (DE) | 2021-09-23 | — | — | US | disclosed |
| EP-3824013-A1 | HETEROCYCLIC FUNCTIONAL POLYETHERS OR POLYETHERCARBONATES AND METHOD FOR THE PRODUCTION THEREOF | Covestro Intellectual Property GmbH & Co. KG (DE) | 2021-05-26 | — | — | EP | disclosed |
| CN-112513139-A | Heterocyclic functional polyethers or polyether carbonates and method for the production thereof | 科思创知识产权两合公司 | 2021-03-16 | — | — | CN | disclosed |
| WO-2020016201-A1 | HETEROCYCLIC FUNCTIONAL POLYETHERS OR POLYETHERCARBONATES AND METHOD FOR THE PRODUCTION THEREOF | COVESTRO DEUTSCHLAND AG (DE) | 2020-01-23 | — | — | WO | disclosed |
| EP-3597690-A1 | HETEROCYCLE-FUNCTIONAL POLYETHER OR POLYETHER CARBONATES AND METHOD FOR THEIR MANUFACTURE | Covestro Deutschland AG (DE) | 2020-01-22 | — | — | EP | disclosed |
| CN-107148690-A | Method for preparing positive active material and positive active material prepared according to the method | ECOPRO BM 有限公司 | 2017-09-08 | — | — | CN | disclosed |
| US-5006444-A | Silver halide photographic material | FUJI PHOTO FILM CO., LTD. (JP) | 1991-04-09 | — | — | US | disclosed |
| EP-0420005-A1 | high contrast silver halide photographic material | FUJI PHOTO FILM CO., LTD. (JP) | 1991-04-03 | — | — | EP | disclosed |
| EP-0398285-A2 | Silver halide photographic materials | FUJI PHOTO FILM CO., LTD. (JP) | 1990-11-22 | — | — | EP | disclosed |
| EP-0395069-A2 | Silver halide photographic materials | FUJI PHOTO FILM CO., LTD. (JP) | 1990-10-31 | — | — | EP | disclosed |
| EP-0393720-A2 | Silver halide photographic materials | FUJI PHOTO FILM CO., LTD. (JP) | 1990-10-24 | — | — | EP | disclosed |
| EP-0335319-A2 | Silver halide photographic material | FUJI PHOTO FILM CO., LTD. (JP) | 1989-10-04 | — | — | EP | disclosed |
| US-4737442-A | INCLUDING A SENSITIZER AND A BLOCKED DEVELOPMENT RESTRAINER; FREE OF BLACK SPOTS | FUJI PHOTO FILM CO., LTD. (JP) | 1988-04-12 | — | — | US | disclosed |