Hydrogen Peroxide

Hydrogen Peroxide

SCHEMBL4382121

O=[N+]([O-])F.OO

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL36020 0.89
Acetic Acid SCHEMBL21855083 0.84
SCHEMBL30642332 0.84
Water SCHEMBL27811370 0.84
Iodide SCHEMBL4421594 0.84
SCHEMBL28089553 0.84
Hydrogen Peroxide SCHEMBL3880134 0.74 MEN1 (0.60)
Hydrogen Peroxide SCHEMBL3880127 0.74
Hydrogen Peroxide SCHEMBL8158598 0.74
Hydrogen Peroxide SCHEMBL28709584 0.74 MEN1 (0.60)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7625784-B2 Semiconductor device and method for manufacturing thereof SEIKO EPSON CORPORATION (JP) 2009-12-01 US disclosed
US-20080026511-A1 Semiconductor device and method for manufacturing thereof SEIKO EPSON CORPORATION (JP) 2008-01-31 US disclosed
US-20060223270-A1 Method of manufacturing semiconductor device SEIKO EPSON CORPORATION (JP) 2006-10-05 US disclosed