SCHEMBL4388485

SCHEMBL4388485

CCC[Al](OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22712628 0.81 TSHR (0.33)
SCHEMBL19713121 0.79 TSHR (0.37)
SCHEMBL11351453 0.78
SCHEMBL19713165 0.77 TSHR (0.42)
SCHEMBL22712603 0.77 TSHR (0.42)
SCHEMBL11444816 0.73
SCHEMBL4400666 0.72
Hydrochloric Acid SCHEMBL9510007 0.69
SCHEMBL22712608 0.69
SCHEMBL818291 0.63 TSHR (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024215620-A1 SELECTIVELY DEPOSITING SILICON OXIDE ON A DIELECTRIC SURFACE OF A SUBSTRATE LAM RESEARCH CORPORATION (US) 2024-10-17 WO disclosed
WO-2024205914-A1 SELECTIVELY DEPOSITING A METAL OXIDE ON A DIELECTRIC SURFACE OF A SUBSTRATE LAM RESEARCH CORPORATION (US) 2024-10-03 WO disclosed
US-11181844-B2 Toner and method of producing toner CANON KABUSHIKI KAISHA (JP) 2021-11-23 US disclosed
US-20200379363-A1 TONER AND METHOD OF PRODUCING TONER CANON KABUSHIKI KAISHA (JP) 2020-12-03 US disclosed
US-20130321924-A1 ANTI-REFLECTION MATERIAL UBE NITTO KASEI CO., LTD. (JP) 2013-12-05 US disclosed
US-8227390-B2 Binder resin for friction material, binder resin composition for friction material, composite material for friction material containing the same, friction material and production method thereof AKEBONO BRAKE INDUSTRY CO., LTD. (JP) 2012-07-24 US disclosed
US-20090137434-A1 BINDER RESIN FOR FRICTION MATERIAL, BINDER RESIN COMPOSITION FOR FRICTION MATERIAL, COMPOSITE MATERIAL FOR FRICTION MATERIAL CONTAINING THE SAME, FRICTION MATERIAL AND PRODUCTION METHOD THEREOF AKEBONO BRAKE INDUSTRY CO., LTD (JP) 2009-05-28 US disclosed