SCHEMBL4388739

SCHEMBL4388739

C1=CC2=NC=NC2C=C1.[Ag]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11706276 1.00
SCHEMBL15812698 0.95
SCHEMBL2679499 0.95
SCHEMBL149252 0.95
SCHEMBL9062624 0.95
SCHEMBL2947629 0.95
SCHEMBL17891967 0.95
SCHEMBL18824151 0.95
SCHEMBL9053323 0.95
Water SCHEMBL4441685 0.93

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3305539-B1 THERMOSENSITIVE RECORDING MATERIAL AND METHOD FOR PRODUCING SAME FUJIFILM CORP (JP) 2021-04-14 EP disclosed
CN-107531069-B Thermosensitive recording material and method for producing same 富士胶片株式会社 2020-07-10 CN disclosed
US-10272708-B2 Thermosensitive recording material and method for manufacturing the same FUJIFILM CORPORATION (JP) 2019-04-30 US disclosed
EP-3305539-A1 THERMOSENSITIVE RECORDING MATERIAL AND METHOD FOR PRODUCING SAME FUJIFILM Corporation (JP) 2018-04-11 EP disclosed
US-20180043717-A1 THERMOSENSITIVE RECORDING MATERIAL AND METHOD FOR MANUFACTURING THE SAME FUJIFILM CORPORATION (JP) 2018-02-15 US disclosed
CN-107531069-A Thermal recording medium and its manufacture method 富士胶片株式会社 2018-01-02 CN disclosed
US-7576036-B2 Heat-sensitive recording material, heat-sensitive recording method and method for manufacturing heat-sensitive recording material FUJIFILM CORPORATION (JP) 2009-08-18 US disclosed
CN-101419394-A High-sensitivity emulsion of photothermographic material, and preparation method and application thereof CHINESE ACAD TECH INST PHYSICS (CN) 2009-04-29 CN disclosed
US-7410744-B2 Recording method FUJIFILM CORPORATION (JP) 2008-08-12 US disclosed
US-20070128542-A1 Recording method FUJIFILM CORPORATION (JP) 2007-06-07 US disclosed
EP-0190054-B1 HEAT-PROCESSABLE COLOR PHOTOSENSITIVE MATERIAL KONICA CORPORATION (JP) 1989-04-19 EP disclosed
EP-0256820-A2 Thermal developing light-sensitive material KONICA CORPORATION (JP) 1988-02-24 EP disclosed
EP-0250558-A1 NOVEL COMPOUNDS AND NOVEL RECORDING MATERIAL USING THE SAME. POLAROID CORP (US) 1988-01-07 EP disclosed
EP-0190512-A2 Positive image forming method KONICA CORPORATION (JP) 1986-08-13 EP disclosed
EP-0190054-A2 Heat-processable color photosensitive material KONICA CORPORATION (JP) 1986-08-06 EP disclosed
US-4347310-A INCREASED PHOTOSENZITIVITY USING GUANIDINE DERIVTIVES AS SENSITIZERS; PHOTOSTABILITY; STORAGE STABILITY ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1982-08-31 US disclosed
US-4234679-A ORGANIC SILVER SALT, SILVER HALIDE, REDUCING AGENT, ORGANIC BROMINE COMPOUND ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1980-11-18 US disclosed
US-4212937-A NITROGEN-CONTAINING HETEROCYCLIC BASE ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1980-07-15 US disclosed
US-4188226-A OXIDIZER, REDUCER, HALOGENATED CARBOCYCLIC COMPOUND ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1980-02-12 US disclosed
US-4173482-A Dry image forming material containing an organic silver salt oxidizing agent, a reducing agent and a halogen molecule ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1979-11-06 US disclosed