⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Oxygen SCHEMBL10414366 | 0.58 | — | — | |
| Oxygen SCHEMBL27480441 | 0.58 | — | — | |
| SCHEMBL50957 | 0.58 | — | — | |
| Iodine SCHEMBL28917092 | 0.58 | — | — | |
| Ammonia Solution, Strong SCHEMBL25368540 | 0.50 | — | — | |
| SCHEMBL93341 | 0.50 | — | — | |
| Ammonia Solution, Strong SCHEMBL4114681 | 0.50 | — | — | |
| Ammonia Solution, Strong SCHEMBL20492107 | 0.50 | — | — | |
| Ammonia Solution, Strong SCHEMBL21404048 | 0.50 | — | — | |
| Charcoal, Activated SCHEMBL1535100 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7562662-B2 | Cleaning solution and cleaning method of a semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-07-21 | — | — | US | claimed |
| US-20070181150-A1 | Cleaning Solution and Cleaning Method of a Semiconductor Device | CONVERSANT INTELLECTUAL PROPERTY MANAGEMENT INC. (CA) | 2007-08-09 | — | — | US | claimed |
| US-7216653-B2 | Cleaning solution and cleaning method of a semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-05-15 | — | — | US | claimed |
| US-20060270575-A1 | Cleaning solution and cleaning method of a semiconductor device | SAMSUNG ELECTRONICS CO., LTD. | 2006-11-30 | — | — | US | claimed |
| US-7105475-B2 | Cleaning solution and cleaning method of a semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-09-12 | — | — | US | claimed |
| US-20040244823-A1 | Cleaning solution and cleaning method of a semiconductor device | CONVERSANT INTELLECTUAL PROPERTY MANAGEMENT INC. (CA) | 2004-12-09 | — | — | US | claimed |
| US-7562662-B2 | Cleaning solution and cleaning method of a semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-07-21 | — | — | US | disclosed |
| US-20070181150-A1 | Cleaning Solution and Cleaning Method of a Semiconductor Device | CONVERSANT INTELLECTUAL PROPERTY MANAGEMENT INC. (CA) | 2007-08-09 | — | — | US | disclosed |
| US-7216653-B2 | Cleaning solution and cleaning method of a semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-05-15 | — | — | US | disclosed |
| US-20060270575-A1 | Cleaning solution and cleaning method of a semiconductor device | SAMSUNG ELECTRONICS CO., LTD. | 2006-11-30 | — | — | US | disclosed |
| US-7105475-B2 | Cleaning solution and cleaning method of a semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-09-12 | — | — | US | disclosed |
| US-20040244823-A1 | Cleaning solution and cleaning method of a semiconductor device | CONVERSANT INTELLECTUAL PROPERTY MANAGEMENT INC. (CA) | 2004-12-09 | — | — | US | disclosed |