⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL686121 | 0.90 | — | — | |
| SCHEMBL47484 | 0.87 | — | — | |
| SCHEMBL10061186 | 0.85 | MAPT (0.32) | — | |
| SCHEMBL11892789 | 0.84 | — | — | |
| SCHEMBL14560958 | 0.83 | — | — | |
| SCHEMBL14557116 | 0.83 | MAPT (0.33) | — | |
| SCHEMBL10027343 | 0.82 | — | — | |
| SCHEMBL12430023 | 0.82 | — | — | |
| SCHEMBL12057576 | 0.81 | — | — | |
| SCHEMBL12869731 | 0.80 | ICAM1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9507258-B2 | Resin and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-11-29 | — | — | US | disclosed |
| US-9291893-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-22 | — | — | US | disclosed |
| US-9221928-B2 | Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9221928-B2 | Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9182664-B2 | Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-11-10 | — | — | US | disclosed |
| US-9182664-B2 | Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-11-10 | — | — | US | disclosed |
| US-9152045-B2 | Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-10-06 | — | — | US | disclosed |
| US-8993212-B2 | Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-20140287359-A1 | Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method | CENTRAL GLASS CO LTD (JP) | 2014-09-25 | — | — | US | disclosed |
| US-8791293-B2 | Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-07-29 | — | — | US | disclosed |
| US-20110318542-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110177453-A1 | Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-07-21 | — | — | US | disclosed |
| US-20110098500-A1 | Polymerizable Fluorine-Containing Compound | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-04-28 | — | — | US | disclosed |
| US-7906269-B2 | Positive-type resist composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-03-15 | — | — | US | disclosed |
| US-7887990-B2 | Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-02-15 | — | — | US | disclosed |
| US-7887990-B2 | Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-02-15 | — | — | US | disclosed |
| US-7541131-B2 | Resist composition, compound for use in the resist composition and pattern forming method using the resist composition | FUJIFILM CORPORATION (JP) | 2009-06-02 | — | — | US | disclosed |
| US-20090061353-A1 | Positive-Type Resist Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |