Known targets — ChEMBL curated mechanism
ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4
The experimentally established mechanism targets of Bromoacetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromoacetic Acid SCHEMBL1332022 | 0.95 | — | — | |
| Bromoacetic Acid SCHEMBL7617676 | 0.95 | — | — | |
| Bromoacetic Acid SCHEMBL23032 | 0.95 | — | — | |
| Bromoacetic Acid SCHEMBL16011275 | 0.95 | TSHR (1.00) | — | |
| Bromoacetic Acid SCHEMBL1332313 | 0.95 | — | — | |
| Bromoacetic Acid SCHEMBL1332132 | 0.95 | — | — | |
| Bromoacetic Acid SCHEMBL3352165 | 0.91 | — | — | |
| Bromoacetic Acid SCHEMBL6913854 | 0.91 | — | — | |
| Bromoacetic Acid SCHEMBL961867 | 0.91 | — | — | |
| Bromoacetic Acid SCHEMBL4372769 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 192 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117659045-A | Synthesis method of desacetoxy cefathiamidine | 江苏汉斯通药业有限公司 | 2024-03-08 | — | — | CN | claimed |
| US-12595286-B2 | Fucose-binding protein, method for producing same, and use of same | TOSOH CORPORATION (JP) | 2026-04-07 | — | — | US | disclosed |
| EP-4679173-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND PRODUCTION METHOD FOR ELECTRONIC DEVICE | FUJIFILM Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| US-20260003268-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORP (JP) | 2026-01-01 | — | — | US | disclosed |
| EP-4644991-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ONIUM SALT | FUJIFILM Corporation (JP) | 2025-11-05 | — | — | EP | disclosed |
| US-20250321480-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ONIUM SALTS | FUJIFILM CORP (JP) | 2025-10-16 | — | — | US | disclosed |
| US-20250236657-A1 | MODIFIED RECOMBINANT ADENO-ASSOCIATED VIRUS (AAV)-BINDING PROTEIN, AND METHOD FOR ANALYZING AAV BASED ON INFECTIVITY | TOSOH CORPORATION (JP) | 2025-07-24 | — | — | US | disclosed |
| WO-2025105466-A1 | MODIFIED FC-BINDING PROTEIN AND METHOD FOR PRODUCING SAME | 東ソー株式会社 | 2025-05-22 | — | — | WO | disclosed |
| WO-2025069991-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2025-04-03 | — | — | WO | disclosed |
| CN-114616228-B | Compound, polymerizable composition, polymer, hologram recording medium, optical material, and optical member | 三菱化学株式会社 | 2024-12-20 | — | — | CN | disclosed |
| US-5438045-A | An 3-acetyl-6-phenyl-2,3,4,5-tetrahydro-8h-pyrido(4'3':4,5)-thieno(3,2 -f)(1,2,4)triazolo(4,3-a)(1,4)diazepine derivative; antiallergens; asthma; antiplatelet activating factor activity | EISAI CO., LTD. (JP) | 1995-08-01 | — | — | US | disclosed |
| US-5409909-A | Antiallergens | EISAI CO., LTD. (JP) | 1995-04-25 | — | — | US | disclosed |
| US-5382579-A | Platelet activating factor antagonists; antiallergens; asthma | EISAI CO., LTD. (JP) | 1995-01-17 | — | — | US | disclosed |
| EP-0606103-A1 | Thieno 3.2-f 1,2,4 triazolo 4,3-a 1,4 -diazepine derivatives as PAF antagonists | Eisai Co., Ltd. (JP) | 1994-07-13 | — | — | EP | disclosed |
| US-5304553-A | Antiallergens; platelet activating factor inhibitor | EISAI CO., LTD. (JP) | 1994-04-19 | — | — | US | disclosed |
| US-5221671-A | Antiallergens, bronchodilator agents | EISAI CO., LTD. (JP) | 1993-06-22 | — | — | US | disclosed |
| EP-0367110-A1 | 1,4-diazepine derivative and its pharmaceutical use | Eisai Co., Ltd. (JP) | 1990-05-09 | — | — | EP | disclosed |
| US-4764518-A | Antibacterial agents containing oxo-4-pyridine carboxylic acid derivatives | PANMEDICA (FR) | 1988-08-16 | — | — | US | disclosed |
| US-4402734-A | N-(HALOALKYL)-N-(CARBOXYALKYL)ANILINE DERIVATIVE | SUMITOMO CHEMICAL CO., LTD. (JP) | 1983-09-06 | — | — | US | disclosed |
| US-4212970-A | PHOTOINITIATORS | FUJI PHOTO FILM CO., LTD. (JP) | 1980-07-15 | — | — | US | disclosed |