SCHEMBL4408067

SCHEMBL4408067

O=CC1=CC2C=CC1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5365847 0.69
SCHEMBL14954341 0.67
SCHEMBL32676379 0.64
SCHEMBL6131421 0.64
SCHEMBL6403991 0.64
Hydrochloric Acid SCHEMBL4460764 0.64
SCHEMBL14953969 0.62
SCHEMBL999684 0.60
SCHEMBL18872204 0.59
SCHEMBL9645980 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0295076-B1 POLYOLEFINS INCORPORATING FUNCTIONAL GROUPS, MASKED FUNCTIONAL GROUP-CONTAINING MONOMERS, REACTION MIXTURES, AND METHODS FOR PREPARING SAME EXXON CHEMICAL PATENTS INC. (US) 1992-09-30 EP claimed
US-10723672-B2 Normal alpha olefin synthesis using dehydroformylation or dehydroxymethylation CHERVON PHILLIPS CHEMICAL COMPANY LP (US) 2020-07-28 US disclosed
US-10435334-B2 Normal alpha olefin synthesis using metathesis and dehydroformylation CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) 2019-10-08 US disclosed
US-20190263729-A1 Normal Alpha Olefin Synthesis Using Dehydroformylation or Dehydroxymethylation THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 2019-08-29 US disclosed
US-20190144356-A1 Normal Alpha Olefin Synthesis Using Metathesis and Dehydroformylation CHEVRON PHILLIPS CHEMICAL COMPANY LP 2019-05-16 US disclosed
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
US-8877422-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-04 US disclosed
EP-2447775-B1 Resist underlayer film composition and patterning process using the same SHINETSU CHEMICAL CO (JP) 2013-05-29 EP disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed
US-20120108071-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed
EP-2447775-A1 Resist underlayer film composition and patterning process using the same Shin-Etsu Chemical Co., Ltd. (JP) 2012-05-02 EP disclosed
US-20110077256-A1 MEDIATORS OF HEDGEHOG SIGNALING PATHWAYS, COMPOSITIONS AND USES RELATED THERETO GUICHERIT OIVIN M 2011-03-31 US disclosed