⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL439036 | 0.86 | — | — | |
| SCHEMBL439034 | 0.81 | — | — | |
| SCHEMBL47496 | 0.80 | CYP19A1 (0.37) | — | |
| SCHEMBL14884196 | 0.79 | CYP19A1 (0.32) | — | |
| SCHEMBL47429 | 0.78 | CYP19A1 (0.40) | — | |
| SCHEMBL98333 | 0.78 | CYP19A1 (0.40) | — | |
| SCHEMBL98491 | 0.78 | CYP19A1 (0.40) | — | |
| SCHEMBL47410 | 0.78 | CYP19A1 (0.40) | — | |
| SCHEMBL47470 | 0.78 | CYP19A1 (0.40) | — | |
| SCHEMBL16905083 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9488914-B2 | Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-11-08 | — | — | US | disclosed |
| US-9221928-B2 | Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | disclosed |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20120328985-A1 | Fluorine-Containing Sulfonate Resin, Fluorine-Containing N-Sulfonyloxyimide Resin, Resist Composition and Pattern Formation Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-12-27 | — | — | US | disclosed |
| US-20120322006-A1 | Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-12-20 | — | — | US | disclosed |
| US-20120064459-A1 | Water Repellent Additive for Immersion Resist | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-15 | — | — | US | disclosed |