⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3622938 | 0.97 | — | — | |
| SCHEMBL3622321 | 0.97 | — | — | |
| SCHEMBL18242021 | 0.97 | — | — | |
| SCHEMBL8572555 | 0.97 | — | — | |
| SCHEMBL4831784 | 0.97 | — | — | |
| SCHEMBL3613136 | 0.97 | — | — | |
| SCHEMBL395761 | 0.97 | — | — | |
| SCHEMBL3624191 | 0.97 | — | — | |
| SCHEMBL2108066 | 0.97 | — | — | |
| SCHEMBL392586 | 0.97 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230303404-A1 | NANOPARTICLES, DISPERSION OF NANOPARTICLES, AND PRODUCTION METHOD OF NANOPARTICLES | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230242692-A1 | COMPOSITION AND CURED PRODUCT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-20220069354-A1 | SULFUR-BASED ELECTROLYTE SOLUTION FOR MAGNESIUM CELL | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2022-03-03 | — | — | US | disclosed |
| EP-3904337-A1 | SULFUR-BASED ELECTROLYTE SOLUTION FOR MAGNESIUM CELL | FUJIFILM Wako Pure Chemical Corporation (JP) | 2021-11-03 | — | — | EP | disclosed |
| US-20210280870-A1 | POSITIVE ELECTRODE ACTIVE MATERIAL FOR MAGNESIUM BATTERIES | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| CN-113166043-A | Electrolyte for sulfur-based magnesium battery | 富士胶片和光纯药株式会社 | 2021-07-23 | — | — | CN | disclosed |
| EP-3832763-A1 | POSITIVE ELECTRODE ACTIVE MATERIAL FOR MAGNESIUM BATTERIES | FUJIFILM Wako Pure Chemical Corporation (JP) | 2021-06-09 | — | — | EP | disclosed |
| WO-2020138377-A1 | SULFUR-BASED ELECTROLYTE SOLUTION FOR MAGNESIUM CELL | 富士フイルム和光純薬株式会社 | 2020-07-02 | — | — | WO | disclosed |
| EP-3174115-B1 | CHARGE TRANSPORT MATERIAL | NISSAN CHEMICAL CORP (JP) | 2020-05-20 | — | — | EP | disclosed |
| CN-107004906-B | Magnesium-containing electrolyte | 富士胶片和光纯药株式会社 | 2020-04-21 | — | — | CN | disclosed |
| CN-101959906-B | Process for producing modified olefin polymer | SUMITOMO CO LTD | 2012-09-05 | — | — | CN | disclosed |
| CN-101993533-A | Isotactic poly(alkylene oxide) and production process thereof | SUMITOMO CHEMICAL CO | 2011-03-30 | — | — | CN | disclosed |
| CN-101959906-A | Process for producing modified olefin polymer | SUMITOMO CHEMICAL CO | 2011-01-26 | — | — | CN | disclosed |
| EP-2138503-A1 | TRANSITION METAL COMPLEX, PROCESS FOR PRODUCING THE SAME, AND USE | Sumitomo Chemical Company, Limited (JP) | 2009-12-30 | — | — | EP | disclosed |
| US-7374857-B2 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2008-05-20 | — | — | US | disclosed |
| US-7312014-B2 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20050038261-A1 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2005-02-17 | — | — | US | disclosed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | disclosed |
| EP-1449833-A1 | BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-25 | — | — | EP | disclosed |
| EP-1406123-A1 | RESIST COMPOSITIONS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-04-07 | — | — | EP | disclosed |