SCHEMBL4447639

SCHEMBL4447639

O=[N+]([O-])[O-].O=[N+]([O-])[O-].O=[N+]([O-])[O-].[N].[N].[N].[N].[N].[N].[Rh+3]

nearest known ligand 0.67

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.67
KMT2A Q03164 1/20 0.67
CA5A P35218 1/20 0.46
CA5B Q9Y2D0 1/20 0.46
TSHR P16473 3/20 0.39
ALDH1A1 P00352 3/20 0.39
TDP1 Q9NUW8 1/20 0.39
HPGD P15428 1/20 0.36
HIF1A Q16665 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5078880 1.00 MEN1 (0.67) MEN1KMT2ACA5ACA5BTSHR
SCHEMBL9166412 0.94 MEN1 (0.75) MEN1KMT2ACA5ACA5BTSHR
SCHEMBL26978 0.94 MEN1 (0.75) MEN1KMT2ACA5ACA5BTSHR
SCHEMBL7556205 0.88 MEN1 (0.67) MEN1KMT2ACA5ACA5BTSHR
Water SCHEMBL8781382 0.88 MEN1 (0.67) MEN1KMT2ACA5ACA5BTSHR
SCHEMBL6035130 0.88 MEN1 (0.67) MEN1KMT2ACA5ACA5BTSHR
Zinc Ion SCHEMBL11852282 0.88 MEN1 (0.67) MEN1KMT2ACA5ACA5BTSHR
SCHEMBL7709606 0.88 MEN1 (0.67) MEN1KMT2ACA5ACA5BTSHR
SCHEMBL6473697 0.88 MEN1 (0.67) MEN1KMT2ACA5ACA5BTSHR
Silver SCHEMBL4475369 0.88

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113008723-A Method for detecting content of high-purity rhodium compound solution 广东金正龙科技有限公司 2021-06-22 CN disclosed
US-7514387-B2 Reformer and method of making the same UMICORE AG & CO. KG (DE) 2009-04-07 US disclosed
US-20060179717-A1 Catalyst on a substrate of a stabilized aluminate and a stabilized zirconate; the aluminate is more resistant to grain growth and the zirconate is more resistant to phase change; substrate is stable in the presence of hydrogen and steam at a temperature of equal to or greater than 1400 degrees C. ASEC MANUFACTURING GENERAL PARTNERSHIP 2006-08-17 US disclosed
US-20040086432-A1 Reformer, systems utilizing the reformer, and methods for operating the systems DELPHI TECHNOLOGIES, INC. 2004-05-06 US disclosed