Acetic Acid

Acetic Acid

SCHEMBL4449017

CC(=O)O.CC(=O)O.CC(=O)O.P

nearest known ligand 0.88

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR3 O14843 2/20 0.88
LCK P06239 1/20 0.88
FYN P06241 1/20 0.88
LMNA P02545 3/20 0.56
TSHR P16473 2/20 0.50
THPO P40225 1/20 0.50
CA1 P00915 3/20 0.46
ALOX15 P16050 1/20 0.46
BLM P54132 1/20 0.46
PMP22 Q01453 1/20 0.46
CA2 P00918 2/20 0.44
CA9 Q16790 1/20 0.44
ALDH1A1 P00352 5/20 0.39
TDP1 Q9NUW8 1/20 0.39
KDM4E B2RXH2 1/20 0.39
PTGS1 P23219 1/20 0.39
MMP12 P39900 1/20 0.39
CA4 P22748 1/20 0.39
SLC15A2 Q16348 1/20 0.38
ACHE P22303 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL8733353 1.00
Acetic Acid SCHEMBL1050321 1.00
Acetic Acid SCHEMBL28993808 1.00 FFAR3 (0.88) FFAR3LCKFYNLMNATSHR
Acetic Acid SCHEMBL8733357 1.00 FFAR3 (0.88) FFAR3LCKFYNLMNATSHR
Acetic Acid SCHEMBL10544757 0.94
Acetic Acid SCHEMBL11052152 0.94
Acetic Acid SCHEMBL7422410 0.94
Acetic Acid SCHEMBL667304 0.94
Acetic Acid SCHEMBL11775226 0.94
Acetic Acid SCHEMBL8105344 0.94

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1216523-A Process for the production of 1,2-diacetoxy esters EASTMAN CHEM CO (US) 1999-05-12 CN claimed
EP-0835901-A2 A method for preparation of recycled polyols and a method for manufacturing polyurethane foams SAMSUNG ELECTRONICS CO., LTD. (KR) 1998-04-15 EP claimed
EP-4291589-B9 METHOD FOR THE RECOVERY OF RAW MATERIALS FROM POLYURETHANE FOAMS COVESTRO DEUTSCHLAND AG (DE) 2025-02-26 EP disclosed
US-20240409492-A1 METHOD FOR CLEAVING (POLY)URETHANES COVESTRO DEUTSCHLAND AG (DE) 2024-12-12 US disclosed
EP-4291589-B1 METHOD FOR THE RECOVERY OF RAW MATERIALS FROM POLYURETHANE FOAMS COVESTRO DEUTSCHLAND AG (DE) 2024-10-23 EP disclosed
EP-4423184-A1 METHOD FOR CLEAVING (POLY)URETHANES Covestro Deutschland AG (DE) 2024-09-04 EP disclosed
CN-118139918-A Method for cleaving (poly) urethanes 科思创德国股份有限公司 2024-06-04 CN disclosed
WO-2023072985-A1 METHOD FOR CLEAVING (POLY)URETHANES COVESTRO DEUTSCHLAND AG (DE) 2023-05-04 WO disclosed
CN-110088681-A Negative light-sensitive resin combination AGC株式会社 2019-08-02 CN disclosed
CN-104805135-B A kind of method of whole-cell catalytic synthesis vanillic aldehyde 深圳大学 2018-11-09 CN disclosed
CN-106031306-B Negative light-sensitive resin combination, resin cured film, partition wall and optical element 旭硝子株式会社 2018-05-22 CN disclosed
CN-1423678-A Flame retardant phosphorus element-containing epoxy resin compositions DOW GLOBAL TECHNOLOGIES INC (US) 2003-06-11 CN disclosed
CN-1216523-A Process for the production of 1,2-diacetoxy esters EASTMAN CHEM CO (US) 1999-05-12 CN disclosed
EP-0835901-A2 A method for preparation of recycled polyols and a method for manufacturing polyurethane foams SAMSUNG ELECTRONICS CO., LTD. (KR) 1998-04-15 EP disclosed
CN-1016430-B Process for preparing cationically improved epoxy resin compositions DOW CHEMICAL CO (US) 1992-04-29 CN disclosed
CN-1053441-A The controlling diaphragm that the epoxy coating that is applied by cathode electrodeposition constitutes DOW CHEMICAL CO (US) 1991-07-31 CN disclosed
CN-1052320-A Electrodeposition coating composition of the Resins, epoxy that the cation type has improved and uses thereof DOW CHEMICAL CO (US) 1991-06-19 CN disclosed
CN-87106486-A Crosslinking agents for control films made of epoxy coatings applied by cathodic electrodeposition 1988-06-29 CN disclosed
CN-87104910-A Cationic improved epoxy resin compositions 1988-05-04 CN disclosed
US-4454312-A CONTAINING ZIRCONIUM TOYO BOSEKI KABUSHIKI KAISHA (JP) 1984-06-12 US disclosed