SCHEMBL4451580

SCHEMBL4451580

CC(C)=C[SiH2]OC([SiH3])(O[SiH2]C=C(C)C)O[SiH2]C=C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5701407 0.75
SCHEMBL27884447 0.74
SCHEMBL5701593 0.70
SCHEMBL1765969 0.69
SCHEMBL8719742 0.67
SCHEMBL23630875 0.67 TSHR (0.33)
SCHEMBL15668205 0.63
SCHEMBL4451579 0.63
SCHEMBL15154813 0.63
SCHEMBL28255928 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118459495-A Preparation method of tris [ (dimethylvinyl) siloxy ] methylsilane and hyperbranched polysiloxane 浙江新安化工集团股份有限公司 2024-08-09 CN claimed
CN-118459495-A Preparation method of tris [ (dimethylvinyl) siloxy ] methylsilane and hyperbranched polysiloxane 浙江新安化工集团股份有限公司 2024-08-09 CN disclosed
CN-118459495-A Preparation method of tris [ (dimethylvinyl) siloxy ] methylsilane and hyperbranched polysiloxane 浙江新安化工集团股份有限公司 2024-08-09 CN disclosed
CN-118459495-A Preparation method of tris [ (dimethylvinyl) siloxy ] methylsilane and hyperbranched polysiloxane 浙江新安化工集团股份有限公司 2024-08-09 CN disclosed
EP-2772505-B1 PHOTOCURABLE RESIN COMPOSITION AND NOVEL SILOXANE COMPOUND ADEKA CORP (JP) 2017-11-15 EP disclosed
US-9063415-B2 Photocurable resin composition and novel siloxane compound ADEKA CORPORATION (JP) 2015-06-23 US disclosed
EP-2772505-A1 PHOTOCURABLE RESIN COMPOSITION AND NOVEL SILOXANE COMPOUND Adeka Corporation (JP) 2014-09-03 EP disclosed
US-20140205949-A1 PHOTOCURABLE RESIN COMPOSITION AND NOVEL SILOXANE COMPOUND ADEKA CORPORATION (JP) 2014-07-24 US disclosed
US-7551830-B2 Impact resistant optical waveguide and method of manufacture thereof DOW CORNING CORPORATION (US) 2009-06-23 US disclosed
US-20090003758-A1 Impact Resistant Optical Waveguide and Method of Manufacture Thereof DOW CORNING CORPORATION 2009-01-01 US disclosed
EP-1979774-A1 IMPACT RESISTANT OPTICAL WAVEGUIDE AND METHOD OF MANUFACTURE THEREOF Dow Corning Corporation (US) 2008-10-15 EP disclosed
WO-2007089340-A1 IMPACT RESISTANT OPTICAL WAVEGUIDE AND METHOD OF MANUFACTURE THEREOF DOW CORNING CORPORATION (US) 2007-08-09 WO disclosed
US-3997497-A Room temperature-curable organopolysiloxane compositions SHIN-ETSU CHEMICAL CO., LTD. (JA) 1976-12-14 US disclosed