⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4401503 | 0.71 | — | — | |
| SCHEMBL158305 | 0.67 | — | — | |
| SCHEMBL2480483 | 0.65 | — | — | |
| SCHEMBL28171981 | 0.65 | — | — | |
| Ethylene SCHEMBL1302525 | 0.63 | — | — | |
| SCHEMBL28404506 | 0.63 | — | — | |
| SCHEMBL309726 | 0.59 | — | — | |
| SCHEMBL420924 | 0.59 | — | — | |
| SCHEMBL67589 | 0.59 | — | — | |
| SCHEMBL4512521 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 232 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109153658-B | Oxime ester derivative compound, photopolymerization initiator containing same, and photosensitive composition | 株式会社三养社 | 2022-11-22 | — | — | CN | claimed |
| CN-107422603-B | Photosensitive resin composition and photocured pattern produced therefrom | 东友精细化工有限公司 | 2022-03-08 | — | — | CN | claimed |
| CN-113227050-A | Carbazole poly-beta-oxime ester derivative compound, photopolymerization initiator containing carbazole poly-beta-oxime ester derivative compound, and photoresist composition | 株式会社三养社 | 2021-08-06 | — | — | CN | claimed |
| EP-3095778-B1 | OXIME ESTER FLUORENE COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING IT, PHOTORESIST COMPOSITION, USES OF THE PHOTORESIST COMPOSITION | SAMYANG CORP (KR) | 2020-12-16 | — | — | EP | claimed |
| EP-2768875-B1 | AMINOPLAST CROSSLINKER RESIN COMPOSITIONS, PROCESS FOR THEIR PREPARATION, AND METHOD OF USE | ALLNEX NETHERLANDS BV (NL) | 2020-12-09 | — | — | EP | claimed |
| WO-2020139042-A2 | CARBAZOLE MULTI BETA OXIME ESTER DERIVATIVE COMPOUND AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION COMPRISING SAME | 주식회사 삼양사 | 2020-07-02 | — | — | WO | claimed |
| CN-107250105-B | Novel oxime ester derivative compound, Photoepolymerizationinitiater initiater and photo-corrosion-resisting agent composition comprising it | 韩国化学研究院 | 2019-08-20 | — | — | CN | claimed |
| EP-2845845-B1 | NOVEL OXIMESTER FLUORINE COMPOUND, AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION COMPRISING SAME | KOREA RES INST CHEMICAL TECH (KR) | 2019-07-03 | — | — | EP | claimed |
| CN-109896990-A | Carbazole oxime ester derivative compound and Photoepolymerizationinitiater initiater and photosensitive composition containing the compound | 株式会社三养社 | 2019-06-18 | — | — | CN | claimed |
| CN-109031888-A | Colored photosensitive resin composition and light shield spacer prepared therefrom | 罗门哈斯电子材料韩国有限公司 | 2018-12-18 | — | — | CN | claimed |
| US-6998415-B2 | Pyrazolyl derivatives; antiinflammatory agents for inflammation; antiallergens for asthma | PHARMACIA CORPORATION (US) | 2006-02-14 | — | — | US | claimed |
| US-20040147565-A1 | Substituted sulfonylphenylheterocycles as cyclooxygenase-2 and 5-lipoxygenase inhibitors | G.D. SEARLE & CO. | 2004-07-29 | — | — | US | claimed |
| EP-0828736-B1 | SUBSTITUTED SULFONYLPHENYLHETEROCYCLES AS CYCLOOXYGENASE-2 AND 5-LIPOXYGENASE INHIBITORS | SEARLE & CO (US) | 2003-07-30 | — | — | EP | claimed |
| EP-0995747-B1 | Substituted sulfonylphenylheterocycles as cyclooxygenase-2 and 5-lipoxygenase inhibitors | SEARLE & CO (US) | 2002-08-07 | — | — | EP | claimed |
| US-20020086886-A1 | Substituted sulfonylphenylheterocycles as cyclooxygenase-2 and 5-lipoxygenase inhibitors | G.D. SEARLE & CO. | 2002-07-04 | — | — | US | claimed |
| EP-0995747-A1 | Substituted sulfonylphenylheterocycles as cyclooxygenase-2 and 5-lipoxygenase inhibitors | G.D. SEARLE & CO. (US) | 2000-04-26 | — | — | EP | claimed |
| EP-0828736-A1 | SUBSTITUTED SULFONYLPHENYLHETEROCYCLES AS CYCLOOXYGENASE-2 AND 5-LIPOXYGENASE INHIBITORS | G.D. SEARLE & CO. (US) | 1998-03-18 | — | — | EP | claimed |
| US-5643933-A | Substituted sulfonylphenylheterocycles as cyclooxygenase-2 and 5-lipoxygenase inhibitors | G. D. SEARLE & CO. (US) | 1997-07-01 | — | — | US | claimed |
| WO-1996038442-A1 | SUBSTITUTED SULFONYLPHENYLHETEROCYCLES AS CYCLOOXYGENASE-2 AND 5-LIPOXYGENASE INHIBITORS | G.D. SEARLE & CO. (US) | 1996-12-05 | — | — | WO | claimed |
| US-4094683-A | HETEROCYCLIC QUATERNARY AMMONIUM COMPOUND AS FOGGING AGENT | FUJI PHOTO FILM CO., LTD. (JA) | 1978-06-13 | — | — | US | claimed |