Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TET2 | Q6N021 | 5/20 | 0.40 |
| ▸ | TET3 | O43151 | 1/20 | 0.40 |
| ▸ | TET1 | Q8NFU7 | 1/20 | 0.40 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.34 |
| ▸ | GRIK2 | Q13002 | 1/20 | 0.34 |
| ▸ | GRM1 | Q13255 | 1/20 | 0.34 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 2/20 | 0.32 |
| ▸ | CA2 | P00918 | 2/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Butadiene SCHEMBL10809539 | 0.92 | TET2 (0.35) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL1074950 | 0.81 | TET2 (0.46) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL243507 | 0.80 | TET2 (0.41) | TET2TET3TET1GRIK1GRIK2 | |
| Water SCHEMBL10629808 | 0.78 | TET2 (0.40) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL1278290 | 0.78 | GABRR1 (0.43) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL2589076 | 0.78 | TET2 (0.40) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL154215 | 0.78 | TET2 (0.40) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL4938556 | 0.78 | TET2 (0.35) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL8010424 | 0.78 | TET2 (0.36) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL5426723 | 0.77 | TET2 (0.43) | TET2TET3TET1GRIK1GRIK2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 167 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8822132-B2 | Colored dispersion, photoresist composition and black matrix | LG CHEM, LTD. (KR) | 2014-09-02 | — | — | US | claimed |
| JP-4804577-B2 | — | — | 2011-11-02 | — | — | JP | claimed |
| US-20110005427-A1 | INFRARED CURABLE INK COMPOSITION FOR COLOR FILTER AND COLOR FILTER | LG CHEM, LTD. (KR) | 2011-01-13 | — | — | US | claimed |
| US-20100104981-A1 | COLORED DISPERSION, PHOTORESIST COMPOSITION AND BLACK MATRIX | LG CHEM, LTD. (KR) | 2010-04-29 | — | — | US | claimed |
| US-20100085518-A1 | PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX | LG CHEM, LTD. (KR) | 2010-04-08 | — | — | US | claimed |
| US-20100081089-A1 | PHOTOSENSITIVE RESIN COMPOSITION COMPRISING A POLYMER PREPARED BY USING MACROMONOMER AS ALKALI SOLUBLE RESIN | LG CHEM, LTD. (KR) | 2010-04-01 | — | — | US | claimed |
| US-20090284698-A1 | Ink composition, color filter manufactured by using the same, and display device comprising the same | LG CHEM., LTD. (KR) | 2009-11-19 | — | — | US | claimed |
| WO-2009061159-A2 | COLORED DISPERSION, PHOTORESIST COMPOSITION AND BLACK MATRIX | LG CHEM. LTD. (KR) | 2009-05-14 | — | — | WO | claimed |
| WO-2008127036-A2 | PHOTOSENSITIVE RESIN COMPOSITION COMPRISING A POLYMER PREPARED BY USING MACROMONOMER AS ALKALI SOLUBLE RESIN | LG CHEM, LTD. (KR) | 2008-10-23 | — | — | WO | claimed |
| WO-2008102990-A1 | PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX | LG CHEM, LTD. (KR) | 2008-08-28 | — | — | WO | claimed |
| WO-2008078953-A1 | BLACK MATRIX HIGH SENSITIVE PHOTORESIST COMPOSITION FOR LIQUID CRYSTAL DISPLAY AND BLACK MATRIX PREPARED BY USING THE SAME | LG CHEM, LTD. (KR) | 2008-07-03 | — | — | WO | claimed |
| EP-0487305-B2 | Method of purifying crude glycidyl (meth)acrylate | MITSUBISHI GAS CHEMICAL CO (JP) | 2000-03-29 | — | — | EP | claimed |
| US-4791166-A | FLUORINATED ACRYLIC ESTER TERPOLYMERS IN HYDROCARBON SOLUTION FOR WATER AND OIL PROOFING TEXTILES | HOECHST CELANESE CORPORATION (US) | 1988-12-13 | — | — | US | claimed |
| WO-2024047976-A1 | PHOTOCURABLE INK-JET INK COMPOSITION | サカタインクス株式会社 | 2024-03-07 | — | — | WO | disclosed |
| WO-2024029176-A1 | PHOTOCURABLE INKJET INK COMPOSITION | ＫＪケミカルズ株式会社 | 2024-02-08 | — | — | WO | disclosed |
| WO-2023234060-A1 | OIL-RESISTANT AGENT COMPOSITION AND OIL-RESISTANT PRODUCT | 明成化学工業株式会社 | 2023-12-07 | — | — | WO | disclosed |
| US-4291097-A | PHOTOPOLYMERIZATION OF AN ACRYLIC ESTER MIXTURE WITH PHOSPHORIC ACID ESTER AND AN ETHANOLAMINE | MITSUBISHI RAYON CO., LTD. (JP) | 1981-09-22 | — | — | US | disclosed |
| US-4274933-A | FORMING A CROSSLINKED HARDENED FILM ON A SUBSTRATE | MITSUBISHI RAYON CO., LTD. (JP) | 1981-06-23 | — | — | US | disclosed |
| EP-0012949-A1 | Coating compositions, process for producing a cross-linked coating film with such compositions and thus produced articles | MITSUBISHI RAYON CO., LTD. (JP) | 1980-07-09 | — | — | EP | disclosed |
| EP-0012948-A1 | Scratch-resistant, dyeable coating compositions for synthetic resin articles | MITSUBISHI RAYON CO., LTD. (JP) | 1980-07-09 | — | — | EP | disclosed |