SCHEMBL4454681

SCHEMBL4454681

CC(CS)O[SiH](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5311537 0.73
SCHEMBL56197 0.71
SCHEMBL2389996 0.71
SCHEMBL4370711 0.71
SCHEMBL30407872 0.69
SCHEMBL30175004 0.69
SCHEMBL3020696 0.67
SCHEMBL1002673 0.67
SCHEMBL3911902 0.67
SCHEMBL2536665 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7518009-B2 Process for preparing mercaptoorganyl (alkoxysilanes) EVONIK DEGUSSA GMBH (DE) 2009-04-14 US claimed
US-20060252952-A1 Process for preparing mercaptoorganyl (alkoxysilanes) DEGUSSA AG (DE) 2006-11-09 US claimed
EP-3719086-B1 ACRYLIC POLYSILOXANE RESIN COATING MATERIAL COMPOSITION AND USE THEREOF CHUGOKU MARINE PAINTS (JP) 2025-05-07 EP disclosed
US-12139635-B2 Coatings for waterproofing electronic components HENKEL AG & CO. KGAA (DE) 2024-11-12 US disclosed
EP-3608367-B1 ROOM-TEMPERATURE-CURABLE ORGANOPOLYSILOXANE COMPOSITION AND BASE MATERIAL SHINETSU CHEMICAL CO (JP) 2024-07-10 EP disclosed
EP-3594220-B1 ORGANOSILICON COMPOUND AND METHOD FOR PRODUCING SAME SHINETSU CHEMICAL CO (JP) 2024-05-08 EP disclosed
US-11555134-B2 Acrylic polysiloxane resin coating compositions and uses thereof CHUGOKU MARINE PAINTS, LTD. (JP) 2023-01-17 US disclosed
CN-115437214-A Chemically amplified positive photosensitive resin composition, protective film, and element having protective film 奇美实业股份有限公司 2022-12-06 CN disclosed
CN-108693710-B Positive photosensitive polysiloxane composition 奇美实业股份有限公司 2022-12-02 CN disclosed
CN-110382594-B Polyoxyalkylene group-containing organosilicon compound and method for producing same 信越化学工业株式会社 2022-07-26 CN disclosed
EP-3594261-B1 POLYOXYALKYLENE GROUP-CONTAINING ORGANOSILICON COMPOUND AND METHOD FOR PRODUCING SAME SHINETSU CHEMICAL CO (JP) 2022-04-13 EP disclosed
US-6995280-B2 Process for preparing (mercaptoorganyl)alkoxysilanes DEGUSSA AG (DE) 2006-02-07 US disclosed
EP-1491547-B1 Organosilicon Compounds DEGUSSA (DE) 2005-12-07 EP disclosed
US-20050124822-A1 Process for the preparation of (mercaptoorganyl)alkoxysilanes EVONIK OPERATIONS GMBH (DE) 2005-06-09 US disclosed
US-20050124821-A1 Process for preparing (mercaptoorganyl)alkoxysilanes EVONIK OPERATIONS GMBH (DE) 2005-06-09 US disclosed
EP-1538152-A1 Process for the preparation of (mercaptoorganyl)-alkoxysilanen Degussa AG (DE) 2005-06-08 EP disclosed
EP-1529782-A1 Process for preparing mercaptoorganyl alkoxy silanes Degussa AG (DE) 2005-05-11 EP disclosed
US-20040266968-A1 bifunctional polysulfidic organosilanes used to improve the reinforcing capability of fillers and as curing agents for natural or synthetic rubbers EVONIK OPERATIONS GMBH (DE) 2004-12-30 US disclosed
EP-1491547-A1 Organosilicon Compounds Degussa AG (DE) 2004-12-29 EP disclosed
WO-1998045368-A1 OLEFIN (CO-)POLYMER COMPOSITIONS AND METHOD OF PRODUCING THE SAME CHISSO CORPORATION (JP) 1998-10-15 WO disclosed