⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL965958 | 0.67 | — | — | |
| SCHEMBL8619869 | 0.59 | — | — | |
| SCHEMBL8452070 | 0.59 | — | — | |
| SCHEMBL22634 | 0.59 | — | — | |
| SCHEMBL207424 | 0.59 | — | — | |
| SCHEMBL8412766 | 0.59 | — | — | |
| SCHEMBL525491 | 0.59 | — | — | |
| Hydrochloric Acid SCHEMBL23581440 | 0.56 | — | — | |
| SCHEMBL2801718 | 0.56 | — | — | |
| SCHEMBL3072589 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119308148-A | Hypertonic stain-proofing agent and application thereof in fabric for preventing water, dirt and oil | 贵州广毅节能环保科技有限公司 | 2025-01-14 | — | — | CN | claimed |
| CN-118372539-A | Oil-water separation composite material and preparation method and application thereof | 武汉纺织大学 | 2024-07-23 | — | — | CN | claimed |
| CN-115851126-A | Radiation refrigeration coating, preparation method thereof and radiation refrigeration coating | 中国科学院宁波材料技术与工程研究所 | 2023-03-28 | — | — | CN | claimed |
| CN-106176250-B | Tooth adhesive system based on new hydrophobic adhesion concept | 浙江大学 | 2020-06-23 | — | — | CN | claimed |
| CN-106137774-B | Pit and fissure sealant based on tooth surface hydrophobization concept | 浙江大学 | 2020-04-17 | — | — | CN | claimed |
| CN-106176250-A | Tooth bonding agent system based on hydrophobic bonding new concept | 浙江大学 | 2016-12-07 | — | — | CN | claimed |
| CN-106137774-A | Pit and fissure sealant based on Tooth surface hydrophobization theory | 浙江大学 | 2016-11-23 | — | — | CN | claimed |
| CN-105703006-A | Electrolyte and negative electrode structure | 通用汽车环球科技运作有限责任公司 | 2016-06-22 | — | — | CN | claimed |
| WO-2025105151-A1 | METHOD OF MANUFACTURING TREATED SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR | FUJIFILM CORPORATION (JP) | 2025-05-22 | — | — | WO | disclosed |
| CN-119768898-A | Chemical solution, method for producing modified substrate, and method for producing laminate | 富士胶片株式会社 | 2025-04-04 | — | — | CN | disclosed |
| CN-119308148-A | Hypertonic stain-proofing agent and application thereof in fabric for preventing water, dirt and oil | 贵州广毅节能环保科技有限公司 | 2025-01-14 | — | — | CN | disclosed |
| CN-119308148-A | Hypertonic stain-proofing agent and application thereof in fabric for preventing water, dirt and oil | 贵州广毅节能环保科技有限公司 | 2025-01-14 | — | — | CN | disclosed |
| CN-118372539-A | Oil-water separation composite material and preparation method and application thereof | 武汉纺织大学 | 2024-07-23 | — | — | CN | disclosed |
| WO-2024070526-A1 | CHEMICAL SOLUTION, METHOD FOR PRODUCING MODIFIED SUBSTRATE, AND METHOD FOR PRODUCING LAYERED BODY | 富士フイルム株式会社 | 2024-04-04 | — | — | WO | disclosed |
| US-7524531-B2 | Structured self-cleaning surfaces and method of forming same | FERRO CORPORATION (US) | 2009-04-28 | — | — | US | disclosed |
| US-20060246277-A1 | Structured self-cleaning surfaces and method of forming same | FERRO CORPORATION (US) | 2006-11-02 | — | — | US | disclosed |
| US-6291022-B1 | AGING SILANE COMPOUND IN TWO STEPS UNDER BASIC AND ACIDIC CONDITIONS TO FORM GRANULAR COLLOIDAL SILICA POLYMER CROSSLINKED WITH LINEAR SILOXANE POLYMER, APPLYING TO GLASS, HEATING TO FORM COARSE SILICA LAYER, APPLYING WATER REPELLENT | SAMSUNG CORNING CO., LTD. (KR) | 2001-09-18 | — | — | US | disclosed |
| US-6235383-B1 | SILICA COATING FORMED BY AGING TETRAETHOXYSILANE SOLUTION IN PRESENCE OF ACID OR BASIC CATALYST; HEAT TREATMENT | SAMSUNG CORNING CO., LTD. (KR) | 2001-05-22 | — | — | US | disclosed |
| US-5661532-A | Chiral smectic liquid crystal device | CANON KABUSHIKI KAISHA (JP) | 1997-08-26 | — | — | US | disclosed |
| US-5303076-A | Chiral smectic liquid crystal device with homogeneous orientation layer on electrodes and homeotropic between electrodes | CANON KABUSHIKI KAISHA (JP) | 1994-04-12 | — | — | US | disclosed |