Acrylic Acid Methyl Ester

Acrylic Acid Methyl Ester

SCHEMBL4463613

C=CC(=O)OC.O=C1C=CC(=O)N1

nearest known ligand 0.44

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GSK3A P49840 1/20 0.44
GSK3B P49841 1/20 0.44
CCR6 P51684 1/20 0.44
NFE2L2 Q16236 3/20 0.36
HCAR2 Q8TDS4 2/20 0.36
KEAP1 Q14145 1/20 0.36
TSHR P16473 7/20 0.34
HPGD P15428 1/20 0.34
ALDH1A1 P00352 3/20 0.33
TP53 P04637 2/20 0.33
HIF1A Q16665 2/20 0.33
TGM2 P21980 1/20 0.33
CYP3A4 P08684 1/20 0.33
HSD17B10 Q99714 1/20 0.33
THRB P10828 3/20 0.33
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoquinone SCHEMBL28170850 0.81 HCAR2 (0.40) NFE2L2HCAR2KEAP1TSHRHPGD
Acrylic Acid Methyl Ester SCHEMBL28328436 0.80
Acrylic Acid Ethyl Ester SCHEMBL28569415 0.79 TSHR (0.47) GSK3AGSK3BCCR6HCAR2TSHR
Acrylic Acid Methyl Ester SCHEMBL1854813 0.78 HCAR2 (0.56) NFE2L2HCAR2KEAP1TSHRHPGD
Acrylic Acid Methyl Ester SCHEMBL7645157 0.78 HCAR2 (0.56) NFE2L2HCAR2KEAP1TSHRHPGD
Acrylic Acid Methyl Ester SCHEMBL9108 0.78
SCHEMBL7168465 0.76 GSK3A (0.55) GSK3AGSK3BCCR6
Acrylic Acid SCHEMBL9443355 0.76 GSK3A (0.55) GSK3AGSK3BCCR6TGM2HSD17B10
Acrylic Acid SCHEMBL380952 0.76 GSK3A (0.55) GSK3AGSK3BCCR6TGM2HSD17B10
Maleic Anhydride SCHEMBL2034123 0.76 HCAR2 (0.36) NFE2L2HCAR2KEAP1TSHRHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110506066-A Resin combination, prepreg, clad with metal foil plywood, resin sheet and printed circuit board MITSUBISHI GAS CHEMICAL CO 2019-11-26 CN disclosed
CN-109748997-A Addition polymers from monomers containing nitrogen heterocycles and monomers containing vinyl aryl cyclobutenes 罗门哈斯电子材料有限责任公司 2019-05-14 CN disclosed
CN-109062007-A positive photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2018-12-21 CN disclosed
CN-107179652-A Positive photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2017-09-19 CN disclosed
CN-103328214-A Lithographic printing plate precursor AGFA GRAPHICS NV 2013-09-25 CN disclosed
CN-101006112-B High gloss rubber modified monovinylidene aromatic polymers produced by bulk polymerization process DOW GLOBAL TECHNOLOGIES INC 2010-05-26 CN disclosed
EP-1618148-B1 HIGH GLOSS RUBBER MODIFIED MONOVINYLIDENE AROMATIC POLYMERS PRODUCED BY A MASS POLYMERIZATION PROCESS DOW GLOBAL TECHNOLOGIES INC (US) 2009-03-25 EP disclosed
CN-101006112-A High gloss rubber modified monovinylidene aromatic polymers produced by bulk polymerization process DOW GLOBAL TECHNOLOGIES INC (US) 2007-07-25 CN disclosed
US-7115684-B2 High gloss rubber modified monovinylidene aromatic polymers produced by a mass polymerization process DOW GLOBAL TECHNOLOGIES INC. (US) 2006-10-03 US disclosed
US-20060122331-A1 High gloss rubber modified monovinylidene aromatic polymers produced by a mass polymerization process TRINSEO EUROPE GMBH (CH) 2006-06-08 US disclosed
EP-1618148-A2 HIGH GLOSS RUBBER MODIFIED MONOVINYLIDENE AROMATIC POLYMERS PRODUCED BY A MASS POLYMERIZATION PROCESS DOW GLOBAL TECHNOLOGIES INC. (US) 2006-01-25 EP disclosed
WO-2004072172-A2 HIGH GLOSS RUBBER MODIFIED MONOVINYLIDENE AROMATIC POLYMERS PRODUCED BY A MASS POLYMERIZATION PROCESS DOW GLOBAL TECHNOLOGIES INC. (US) 2004-08-26 WO disclosed