⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL442194 | 0.75 | EHMT2 (0.33) | — | |
| SCHEMBL17985471 | 0.73 | EHMT2 (0.32) | — | |
| SCHEMBL17985463 | 0.73 | EHMT2 (0.32) | — | |
| SCHEMBL9453859 | 0.69 | — | — | |
| SCHEMBL2376776 | 0.69 | — | — | |
| SCHEMBL104168 | 0.67 | — | — | |
| SCHEMBL11301444 | 0.67 | — | — | |
| SCHEMBL24375 | 0.67 | — | — | |
| SCHEMBL34049 | 0.67 | — | — | |
| SCHEMBL8663660 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 201 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0488029-B1 | Silver halide photographic light-sensitive material | FUJI PHOTO FILM CO LTD (JP) | 1997-06-04 | — | — | EP | claimed |
| US-10767112-B2 | Methods of producing metal sulfides, metal selenides, and metal sulfides/selenides having controlled architectures using kinetic control | THE TRUSTEES OF THE COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK (US) | 2020-09-08 | — | — | US | disclosed |
| US-20170369779-A1 | METHODS OF PRODUCING METAL SULFIDES, METAL SELENIDES, AND METAL SULFIDES/SELENIDES HAVING CONTROLLED ARCHITECTURES USING KINETIC CONTROL | THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK (US) | 2017-12-28 | — | — | US | disclosed |
| US-9312409-B2 | Ink for producing compound semiconductor thin film, compound semiconductor thin film produced using the ink, solar cell having compound semiconductor the thin film, and process for producing solar cell | TOPPAN PRINTING CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| CN-103069572-B | Ink for producing compound semiconductor thin film, compound semiconductor thin film obtained using the ink, solar cell provided with the compound semiconductor thin film, and method for producing the solar cell | TOPPAN PRINTING CO.,LTD. (JP) | 2016-01-20 | — | — | CN | disclosed |
| EP-2608274-A1 | INK FOR PRODUCTION OF COMPOUND SEMICONDUCTOR THIN FILM, COMPOUND SEMICONDUCTOR THIN FILM PRODUCED USING THE INK, SOLAR CELL EQUIPPED WITH THE COMPOUND SEMICONDUCTOR THIN FILM, AND PROCESS FOR PRODUCTION OF THE SOLAR CELL | Toppan Printing Co., Ltd. (JP) | 2013-06-26 | — | — | EP | disclosed |
| US-20130153033-A1 | INK FOR PRODUCING COMPOUND SEMICONDUCTOR THIN FILM, COMPOUND SEMICONDUCTOR THIN FILM PRODUCED USING THE INK, SOLAR CELL HAVING COMPOUND SEMICONDUCTOR THE THIN FILM, AND PROCESS FOR PRODUCING SOLAR CELL | TOPPAN PRINTING CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |
| CN-103069572-A | Ink for producing compound semiconductor thin film, compound semiconductor thin film obtained using the ink, solar cell provided with the compound semiconductor thin film, and method for producing the solar cell | TOPPAN PRINTING CO LTD | 2013-04-24 | — | — | CN | disclosed |
| US-7531298-B2 | Silver halide color photosensitive material | FUJIFILM CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| US-7439309-B2 | Silver halide photographic light-sensitive material, photographic emulsion, and mercapto group-containing polymer compound used for them | FUJIFILM CORPORATION (JP) | 2008-10-21 | — | — | US | disclosed |
| EP-0590593-A2 | Silver halide photographic material | FUJI PHOTO FILM CO., LTD. (JP) | 1994-04-06 | — | — | EP | disclosed |
| EP-0576880-A1 | Silver halide photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1994-01-05 | — | — | EP | disclosed |
| US-5266457-A | Phosphine sulfide as sensitizer | FUJI PHOTO FILM CO., LTD. (JP) | 1993-11-30 | — | — | US | disclosed |
| EP-0563701-A1 | Silver halide photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-06 | — | — | EP | disclosed |
| EP-0562476-A1 | A silver halide photographic emulsion and a photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1993-09-29 | — | — | EP | disclosed |
| EP-0561415-A1 | Method of preparing silver halide photographic emulsion, emulsion, and light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1993-09-22 | — | — | EP | disclosed |
| US-5242791-A | Sensitization, storage stability, reduced fog | FUJI PHOTO FILM CO., LTD. (JP) | 1993-09-07 | — | — | US | disclosed |
| EP-0482599-A1 | Silver halide photographic light-sensitive material | Fuji Photo Film Co., Ltd. (JP) | 1992-04-29 | — | — | EP | disclosed |
| EP-0454149-A1 | Silver halide photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1991-10-30 | — | — | EP | disclosed |
| US-5004679-A | Having grains formed by nucleation/crystallization of fine particles and ripened in solvent | FUJI PHOTO FILM CO., LTD. (JP) | 1991-04-02 | — | — | US | disclosed |