SCHEMBL4480150

SCHEMBL4480150

O=P(O)(O)OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
LPAR3 Q9UBY5 5/20 0.34
LPAR2 Q9HBW0 3/20 0.34
LPAR1 Q92633 2/20 0.34
MVD P53602 1/20 0.31
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26908444 1.00 LPAR3 (0.34) LPAR3LPAR2LPAR1MVDTHRB
SCHEMBL4625453 1.00 LPAR3 (0.34) LPAR3LPAR2LPAR1MVDTHRB
SCHEMBL26908454 1.00 LPAR3 (0.34) LPAR3LPAR2LPAR1MVDTHRB
SCHEMBL4624040 1.00 LPAR3 (0.34) LPAR3LPAR2LPAR1MVDTHRB
SCHEMBL4625298 1.00 LPAR3 (0.34) LPAR3LPAR2LPAR1MVDTHRB
SCHEMBL2304765 1.00 LPAR3 (0.34) LPAR3LPAR2LPAR1MVDTHRB
SCHEMBL27088152 0.98 LPAR3 (0.33) LPAR3LPAR2LPAR1MVD
Ammonia Solution, Strong SCHEMBL28622117 0.98 LPAR3 (0.33) LPAR3LPAR2LPAR1MVD
SCHEMBL26908446 0.98 LPAR3 (0.35) LPAR3LPAR2LPAR1MVD
Diethylamine SCHEMBL16774441 0.89 LPAR3 (0.35) LPAR3LPAR2LPAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114927670-B Modified ternary positive electrode material and preparation method and application thereof 蜂巢能源科技股份有限公司 2024-04-09 CN claimed
CN-116946990-A Wet phosphoric acid purifying process 宜都兴发化工有限公司 2023-10-27 CN claimed
CN-116902936-A Process for extracting impurities in wet phosphoric acid 宜都兴发化工有限公司 2023-10-20 CN claimed
CN-116835542-A Wet process phosphoric acid cation removing method 宜都兴发化工有限公司 2023-10-03 CN claimed
CN-116750735-A Wet phosphoric acid purification method 宜都兴发化工有限公司 2023-09-15 CN claimed
CN-114927670-A Modified ternary cathode material and preparation method and application thereof 蜂巢能源科技股份有限公司 2022-08-19 CN claimed
WO-2026102095-A1 METHODS FOR DETECTING PER- OR POLY-FLUOROALKYL SUBSTANCES WITH FLUOROPHORES UNIVERSITY OF UTAH RESEARCH FOUNDATION (US) 2026-05-15 WO disclosed
US-12319594-B2 Composition and method for capture and degradation of PFAS BATTELLE MEMORIAL INSTITUTE (US) 2025-06-03 US disclosed
WO-2025105261-A1 ACTIVATED CARBON, ADSORPTION FILTER INCLUDING SAME, WATER PURIFIER, AND METHOD FOR PRODUCING ACTIVATED CARBON 株式会社クラレ 2025-05-22 WO disclosed
US-20250110101-A1 PER AND POLYFLUOROALKYL SUBSTANCE MEASUREMENT DEXSIL CORPORATION (US) 2025-04-03 US disclosed
CN-118330092-A Synchronous detection method for full/polyfluoroalkyl substances in water sample 中山大学 2024-07-12 CN disclosed
CN-114927670-B Modified ternary positive electrode material and preparation method and application thereof 蜂巢能源科技股份有限公司 2024-04-09 CN disclosed
US-20240059860-A1 METHODS AND SYSTEMS FOR DESTRUCTION OF SYNTHETIC PER- AND POLYFLUORO COMPOUNDS CHZ TECHNOLOGIES, LLC 2024-02-22 US disclosed
US-20060177532-A1 Imprint lithography method to control extrusion of a liquid from a desired region on a substrate MOLECULAR IMPRINTS, INC. 2006-08-10 US disclosed
US-20060177535-A1 Imprint lithography template to facilitate control of liquid movement MOLECULAR IMPRINTS, INC. 2006-08-10 US disclosed
US-6811854-B1 AGENT INCLUDING METAL ALKOXIDE AND POLYMER HAVING REPEATING UNITS DERIVED FROM MONOMER HAVING CARBON-CARBON DOUBLE BOND AND METAL ALKOXIDE GROUP, FLUORINE-FREE (METH)ACRYLIC ACID DERIVATIVE MONOMER, AND FLUORINE-CONTAINING COMPOUND DAIKIN INDUSTRIES, LTD. (JP) 2004-11-02 US disclosed
US-20040186216-A1 Surface-treating agent comprising inorganic/organic composite material DAIKIN INDUSTRIES LTD. (JP) 2004-09-23 US disclosed
EP-1389634-A1 SURFACE-TREATING AGENT COMPRISING INORGANIC/ORGANIC COMPOSITE MATERIAL Daikin Industries, Ltd. (JP) 2004-02-18 EP disclosed
EP-1227183-A1 SURFACE-TREATING AGENT COMPRISING INORGANIC/ORGANIC HYBRID MATERIAL Daikin Industries, Ltd. (JP) 2002-07-31 EP disclosed
EP-1167616-A1 SURFACE-TREATING AGENT COMPRISING INORGANIC/ORGANIC HYBRID MATERIAL Daikin Industries, Ltd. (JP) 2002-01-02 EP disclosed