SCHEMBL4492333

SCHEMBL4492333

COC(C(C)C)C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12927463 0.91 HSD17B10 (0.33)
SCHEMBL12927499 0.91 HSD17B10 (0.33)
SCHEMBL12927500 0.91 HSD17B10 (0.33)
SCHEMBL12927491 0.87 HSD17B10 (0.31)
SCHEMBL12927461 0.87 HSD17B10 (0.31)
SCHEMBL12927492 0.87 HSD17B10 (0.31)
SCHEMBL12927465 0.87 HSD17B10 (0.31)
SCHEMBL12927496 0.87 HSD17B10 (0.31)
SCHEMBL12927494 0.87 HSD17B10 (0.31)
SCHEMBL12927493 0.87 HSD17B10 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3512851-B1 BETA-LACTAMASE INHIBITOR COMPOUNDS ENTASIS THERAPEUTICS LTD (GB) 2022-07-06 EP disclosed
EP-1655291-B1 COMPOUNDS HAVING THROMBOPOIETIN RECEPTOR AGONISM SHIONOGI & CO (JP) 2016-08-03 EP disclosed
US-9188859-B2 Positive photosensitive resin composition and method for forming patterns by using the same CHI MEI CORPORATION (TW) 2015-11-17 US disclosed
US-9190521-B2 Positive photosensitive resin composition and uses thereof CHI MEI CORPORATION (TW) 2015-11-17 US disclosed
EP-2353048-B1 PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD FUJIFILM CORP (JP) 2015-02-25 EP disclosed
US-8912304-B2 Polyol-based polymers MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2014-12-16 US disclosed
US-8673908-B2 Kynurenine production inhibitor KYOWA HAKKO KIRIN CO., LTD. (JP) 2014-03-18 US disclosed
US-8673908-B2 Kynurenine production inhibitor KYOWA HAKKO KIRIN CO., LTD. (JP) 2014-03-18 US disclosed
US-20140065526-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERNS BY USING THE SAME CHI MEI CORPORATION (TW) 2014-03-06 US disclosed
US-20130306970-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF CHI MEI CORPORATION (TW) 2013-11-21 US disclosed
EP-2154140-A1 Metallocenyl phthalocyanine compounds and use thereof in optical recording media Orgchem Technologies, Inc. (TW) 2010-02-17 EP disclosed
US-20090318513-A1 COMPOUNDS EXHIBITING THROMBOPOIETIN RECEPTOR AGONISM SHIONOGI & CO., LTD. 2009-12-24 US disclosed
EP-2135901-A1 COMPOUND FOR PHOTORESIST, PHOTORESIST SOLUTION, AND ETCHING METHOD USING THE PHOTORESIST SOLUTION Fujifilm Corporation (JP) 2009-12-23 EP disclosed
US-7601746-B2 Compounds exhibiting thrombopoietin receptor agonism SHIONOGI & CO., LTD. (JP) 2009-10-13 US disclosed
US-20080220367-A1 Metallocenyl Phthalocyanine Compounds and Use Thereof ORGCHEM TECHNOLOGIES INC (TW) 2008-09-11 US disclosed
US-20080220367-A1 Metallocenyl Phthalocyanine Compounds and Use Thereof ORGCHEM TECHNOLOGIES INC (TW) 2008-09-11 US disclosed
EP-1811341-A1 Positive photosensitive composition and method of forming pattern using the same Fujifilm Corporation (JP) 2007-07-25 EP disclosed
US-20070043087-A1 Such as 3-{2,6-difluoro-4-[4,5-dihydro-6-(3,3-dimethylbutyl)naphtho[1,2-d]thiazol-2-ylcabamoyl)phenyl]-2-methylacrylic acid EDDINGPHARM (HONG KONG) COMPANY LIMITED (CN) 2007-02-22 US disclosed
EP-1655291-A1 COMPOUNDS HAVING THROMBOPOIETIN RECEPTOR AGONISM SHIONOGI & CO., LTD. (JP) 2006-05-10 EP disclosed
EP-0297456-A2 Immunosuppressant peptides MERRELL DOW PHARMACEUTICALS INC. (US) 1989-01-04 EP disclosed