SCHEMBL449731

SCHEMBL449731

CO[SiH](CCCNCCN)OC

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 5/20 0.48
CA6 P23280 5/20 0.48
CA7 P43166 5/20 0.48
CA9 Q16790 5/20 0.48
CA14 Q9ULX7 5/20 0.48
CA5B Q9Y2D0 5/20 0.48
CA2 P00918 4/20 0.48
CA4 P22748 4/20 0.48
CA5A P35218 4/20 0.48
CA3 P07451 3/20 0.48
MEN1 O00255 2/20 0.46
RECQL P46063 2/20 0.46
KMT2A Q03164 2/20 0.46
LMNA P02545 3/20 0.43
TDP1 Q9NUW8 3/20 0.43
ALOX15 P16050 3/20 0.43
CA1 P00915 2/20 0.43
ALDH1A1 P00352 1/20 0.43
TP53 P04637 1/20 0.43
KDM4E B2RXH2 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6510548 0.98 CA12 (0.48) CA12CA6CA7CA9CA14
SCHEMBL16776784 0.93 CA12 (0.50) CA12CA6CA7CA9CA14
SCHEMBL27989 0.93 CA12 (0.46) CA12CA6CA7CA9CA14
SCHEMBL19549540 0.91 CA12 (0.44) CA12CA6CA7CA9CA14
SCHEMBL483129 0.91 CA12 (0.46) CA12CA6CA7CA9CA14
SCHEMBL6444263 0.91 CA12 (0.44) CA12CA6CA7CA9CA14
SCHEMBL8429184 0.91 CA12 (0.44) CA12CA6CA7CA9CA14
SCHEMBL16100183 0.91 CYP2C19 (0.35) CA12CA6CA7CA9CA14
SCHEMBL8470067 0.90 CA12 (0.50) CA12CA6CA7CA9CA14
SCHEMBL8381603 0.90 CA12 (0.50) CA12CA6CA7CA9CA14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 686 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12478924-B2 Method for preparing durably hydrophilic and uniform-pore ultrafiltration membrane TIANGONG UNIVERSITY (CN) 2025-11-25 US claimed
CN-119841605-A High-strength heat-preservation gangue foam concrete, and preparation method and application thereof 山东交通学院 2025-04-18 CN claimed
CN-115821610-B Deepening agent for washable cotton, preparation method and application thereof 上海拓纳化学新材料有限公司 2025-04-11 CN claimed
CN-118909528-A Water-based electrogalvanizing chromium-free fingerprint resistant agent 立邦(上海)化工有限公司 2024-11-08 CN claimed
CN-118806279-A Hydrophilic treatment method of quantitative sampler 厦门为正生物科技股份有限公司 2024-10-22 CN claimed
CN-118085294-B Preparation method of modified siloxane emulsion and hair conditioner containing modified siloxane emulsion 广东顶度生物科技有限公司 2024-08-23 CN claimed
CN-118221941-A Silicon-containing acrylic ester-styrene-acrylonitrile core-shell grafted copolymer and preparation method thereof 上海中化科技有限公司 2024-06-21 CN claimed
CN-118221935-A Polyamide acid slurry with low water absorption rate and polyimide film prepared from polyamide acid slurry 武汉柔显科技股份有限公司 2024-06-21 CN claimed
CN-118085294-A Preparation method of modified siloxane emulsion and hair conditioner containing modified siloxane emulsion 广东顶度生物科技有限公司 2024-05-28 CN claimed
CN-118085803-A Adhesive composition, adhesive, preparation method and application of adhesive 天合光能股份有限公司 2024-05-28 CN claimed
EP-2089444-A1 RADIATION-CURABLE COMPOUNDS BASF SE (DE) 2009-08-19 EP claimed
EP-2089445-A1 RADIATION-CURABLE COMPOUNDS BASF SE (DE) 2009-08-19 EP claimed
WO-2008043722-A1 RADIATION-CURABLE COMPOUNDS BASF SE (DE) 2008-04-17 WO claimed
WO-2008043723-A1 RADIATION-CURABLE COMPOUNDS BASF SE (DE) 2008-04-17 WO claimed
EP-0798590-B1 Coating composition, transparent electrode substrate with such a coating, and liquid crystal display element with such a substrate TEIJIN LTD (JP) 2004-05-12 EP claimed
US-6171663-B1 ELECTRODE SUBSTRATE COMPRISING A METAL OXIDE LAYER, A CURED POLYMER LAYER OBTAINED FROM CROSS-LINKING OF A SILICON MONOMER HAVING EPOXY AND ALKOXYSILYL GROUPS, SILICON MONOMER HAVING AMINO AND ALKOXYSILANE, A POLYMERIC VINYL ALCOHOLS TEIJIN LIMITED (JP) 2001-01-09 US claimed
EP-0798590-A2 Liquid crystal display element with a transparent electrode substrate, and the transparent electrode substrate TEIJIN LIMITED (JP) 1997-10-01 EP claimed
EP-0391226-B1 Method for manufacturing layer-built material with silicon dioxide film containing organic colorant and the layer-built material manufactured thereby NIPPON SHEET GLASS CO LTD (JP) 1994-07-13 EP claimed
US-5114760-A Saturation of silicon dioxide with hydrosilicofluoric acid and treating with an organic color NIPPON SHEET GLASS CO., LTD. (JP) 1992-05-19 US claimed
EP-0391226-A1 Method for manufacturing layer-built material with silicon dioxide film containing organic colorant and the layer-built material manufactured thereby NIPPON SHEET GLASS CO. LTD. (JP) 1990-10-10 EP claimed