SCHEMBL4527445

SCHEMBL4527445

[Co].[Fe].[Ta]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL32659725 0.87
SCHEMBL29598801 0.87
SCHEMBL7972380 0.87
SCHEMBL197419 0.87
SCHEMBL29270394 0.87
SCHEMBL21328559 0.87
SCHEMBL18204297 0.82
SCHEMBL82413 0.82
SCHEMBL29435147 0.82
SCHEMBL2112050 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12527232-B2 BiSb topological insulator with seed layer or interlayer to prevent Sb diffusion and promote BiSb (012) orientation WESTERN DIGITAL TECHNOLOGIES, INC. (US) 2026-01-13 US claimed
US-20250295039-A1 Tunnel Magneto-Resistive Sensor With Thin Nonmagnetic Material In Free Layer HEADWAY TECHNOLOGIES, INC. 2025-09-18 US claimed
CN-112059195-B Preparation method of ferrotantalum alloy powder, ferrotantalum alloy powder and application 宁波江丰电子材料股份有限公司 2023-08-15 CN claimed
CN-111992730-B Preparation method of cobalt-tantalum alloy powder, cobalt-tantalum alloy powder and application 宁波江丰电子材料股份有限公司 2023-04-18 CN claimed
CN-111957982-B Preparation method of iron-cobalt-tantalum alloy powder, iron-cobalt-tantalum alloy powder and application 宁波江丰电子材料股份有限公司 2023-02-03 CN claimed
WO-2022041741-A1 IRON-COBALT-TANTALUM ALLOY POWDER PREPARATION METHOD, IRON-COBALT-TANTALUM ALLOY POWDER AND USE THEREOF 宁波江丰电子材料股份有限公司 2022-03-03 WO claimed
CN-112059195-A Preparation method of iron-tantalum alloy powder, iron-tantalum alloy powder and application 宁波江丰电子材料股份有限公司 2020-12-11 CN claimed
CN-111992730-A Preparation method of cobalt-tantalum alloy powder, cobalt-tantalum alloy powder and application 宁波江丰电子材料股份有限公司 2020-11-27 CN claimed
CN-111560587-A Iron-cobalt-tantalum alloy sputtering target material and preparation method thereof 宁波江丰电子材料股份有限公司 2020-08-21 CN claimed
EP-3563432-A1 PERPENDICULAR SPIN TRANSFER TORQUE MAGNETIC MECHANISM INTEL Corporation (US) 2019-11-06 EP claimed
US-20190280188-A1 PERPENDICULAR SPIN TRANSFER TORQUE MAGNETIC MECHANISM INTEL CORPORATION 2019-09-12 US claimed
CN-108004515-A Preparation method, iron cobalt tantalum alloy-sputtering targets material and the application of iron cobalt tantalum alloy-sputtering targets material 宁波江丰电子材料股份有限公司 2018-05-08 CN claimed
US-20250331428-A1 SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURE TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2025-10-23 US disclosed
EP-3721485-B1 METHODS OF MANUFACTURING INTEGRATED CIRCUITS USING ISOTROPIC AND ANISOTROPIC ETCHING PROCESSES EVERSPIN TECHNOLOGIES INC (US) 2025-10-01 EP disclosed
US-20250295039-A1 Tunnel Magneto-Resistive Sensor With Thin Nonmagnetic Material In Free Layer HEADWAY TECHNOLOGIES, INC. 2025-09-18 US disclosed
US-12356867-B2 Semiconductor structure and method of manufacture TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED (TW) 2025-07-08 US disclosed
US-20150137293-A1 Spin-Transfer Torque Magnetic Random Access Memory (STTMRAM) with Perpendicular Laminated Free Layer STRUCTURED ALPHA LP (CA) 2015-05-21 US disclosed
US-9025371-B1 Spin-transfer torque magnetic random access memory (STTMRAM) with perpendicular laminated free layer AVALANCHE TECHNOLOGY, INC. (US) 2015-05-05 US disclosed
US-7564657-B2 Magnetoresistive device, thin film magnetic head, head gimbal assembly and magnetic disk unit exhibiting superior magnetoresistive effect TDK CORPORATION (JP) 2009-07-21 US disclosed
US-20050213262-A1 Magnetoresistive device, thin film magnetic head, head gimbal assembly and magnetic disk unit TDK CORPORATION (JP) 2005-09-29 US disclosed