⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17798804 | 0.91 | — | — | |
| SCHEMBL45345 | 0.89 | — | — | |
| Charcoal, Activated SCHEMBL3115984 | 0.80 | — | — | |
| SCHEMBL1116316 | 0.80 | — | — | |
| Magnesium SCHEMBL224831 | 0.80 | — | — | |
| SCHEMBL23878703 | 0.80 | — | — | |
| SCHEMBL17699235 | 0.80 | — | — | |
| SCHEMBL10611491 | 0.80 | — | — | |
| SCHEMBL20952051 | 0.80 | — | — | |
| SCHEMBL154001 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 105 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230327181-A1 | STABILIZATION OF LI-ION BATTERY ANODES | GEORGIA TECH RESEARCH CORPORATION | 2023-10-12 | — | — | US | claimed |
| CN-115667192-A | Process for producing vinyl fluoride | 大金工业株式会社 | 2023-01-31 | — | — | CN | claimed |
| EP-3227942-A1 | NANOCOMPOSITE PARTICLES OF CONVERSION CHEMISTRY AND MIXED ELECTRONIC IONIC CONDUCTOR MATERIALS | QuantumScape Corporation (US) | 2017-10-11 | — | — | EP | claimed |
| US-7176119-B2 | Method of fabricating copper damascene and dual damascene interconnect wiring | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-02-13 | — | — | US | claimed |
| EP-1198848-A1 | COATED CONDUCTOR THICK FILM PRECURSOR | American Superconductor Corporation (US) | 2002-04-24 | — | — | EP | claimed |
| WO-2001008236-A1 | COATED CONDUCTOR THICK FILM PRECURSOR | AMERICAN SUPERCONDUCTOR CORPORATION (US) | 2001-02-01 | — | — | WO | claimed |
| US-20260135091-A1 | ELECTRODES, LITHIUM-ION BATTERIES, AND METHODS OF MAKING AND USING SAME | SILA NANOTECHNOLOGIES INC (US) | 2026-05-14 | — | — | US | disclosed |
| US-12537190-B2 | Electrodes, lithium-ion batteries, and methods of making and using same | SILA NANOTECHNOLOGIES, INC. (US) | 2026-01-27 | — | — | US | disclosed |
| US-20250305171-A1 | MATERIAL COMPONENTS PROTECTION AGAINST THE CORROSIVE ACTION CRYOLITE MELTS IN ALUMINIUM REDUCTION CELLS | GONTHIER GHISLAIN (CA) | 2025-10-02 | — | — | US | disclosed |
| US-12366003-B2 | Material components protection against the corrosive action cryolite melts in aluminium reduction cells | Gonthier, Ghislain (CA) | 2025-07-22 | — | — | US | disclosed |
| CN-114999918-B | Display panel and preparation method thereof | 深圳市华星光电半导体显示技术有限公司 | 2025-01-10 | — | — | CN | disclosed |
| CN-114999918-B | Display panel and preparation method thereof | 深圳市华星光电半导体显示技术有限公司 | 2025-01-10 | — | — | CN | disclosed |
| US-20240282934-A1 | ELECTRODES, LITHIUM-ION BATTERIES, AND METHODS OF MAKING AND USING SAME | GEORGIA TECH RESEARCH CORPORATION | 2024-08-22 | — | — | US | disclosed |
| US-5892135-A | FROM CHLOROFLUOROETHANES, RUTHENIUM, COPPER, NICKEL OR CHROMIUM OR OXIDES, HALIDES OR OXYHALIDES OF THESE METALS AS CATALYSTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-04-06 | — | — | US | disclosed |
| WO-1998037043-A2 | PROCESSES FOR THE MANUFACTURE OF 1,1,1,3,3-PENTAFLUOROPROPENE, 2-CHLORO-PENTAFLUOROPROPENE AND COMPOSITIONS COMPRISING SATURATED DERIVATIVES THEREOF | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-08-27 | — | — | WO | disclosed |
| EP-0729397-B1 | FLUXLESS SOLDERING PRETREATING SYSTEM AND METHOD USING FLUORINE-CONTAINING PLASMA | MCNC (US) | 1998-06-10 | — | — | EP | disclosed |
| EP-0729397-A1 | FLUXLESS SOLDERING PRETREATING SYSTEM AND METHOD USING FLUORINE-CONTAINING PLASMA | MCNC (US) | 1996-09-04 | — | — | EP | disclosed |
| US-5499754-A | Fluxless soldering sample pretreating system | MCNC (US) | 1996-03-19 | — | — | US | disclosed |
| WO-1995013896-A1 | FLUXLESS SOLDERING PRETREATING SYSTEM AND METHOD USING FLUORINE-CONTAINING PLASMA | MCNC (US) | 1995-05-26 | — | — | WO | disclosed |
| US-5407121-A | Surface of copper layer is pretreated with fluorine containing plasma which react with copper oxide film forming copper oxyfluoride permitting solder wetting, placing tin or tin-lead alloy on pretreated surface, reflowing | MCNC (US) | 1995-04-18 | — | — | US | disclosed |