⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9632282 | 0.71 | — | — | |
| SCHEMBL1563612 | 0.71 | — | — | |
| SCHEMBL7025326 | 0.67 | — | — | |
| SCHEMBL1491186 | 0.67 | — | — | |
| SCHEMBL7521130 | 0.67 | — | — | |
| SCHEMBL1938151 | 0.67 | — | — | |
| SCHEMBL7568876 | 0.64 | — | — | |
| SCHEMBL19947455 | 0.63 | — | — | |
| SCHEMBL5908129 | 0.63 | — | — | |
| Lithium SCHEMBL31390464 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9803161-B2 | Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surface | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2017-10-31 | — | — | US | disclosed |
| US-20150140820-A1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-05-21 | — | — | US | disclosed |
| EP-2843689-A1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | Wako Pure Chemical Industries, Ltd. (JP) | 2015-03-04 | — | — | EP | disclosed |
| EP-2647693-A1 | SUBSTRATE CLEANER FOR COPPER WIRING, AND METHOD FOR CLEANING COPPER WIRING SEMICONDUCTOR SUBSTRATE | Wako Pure Chemical Industries, Ltd. (JP) | 2013-10-09 | — | — | EP | disclosed |
| US-20130261040-A1 | SUBSTRATE CLEANER FOR COPPER WIRING, AND METHOD FOR CLEANING COPPER WIRING SEMICONDUCTOR SUBSTRATE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2013-10-03 | — | — | US | disclosed |
| US-20090036353-A1 | Insulin Derivatives Conjugated with Structurally Well Defined Branched Polymers | NOVO NORDISK A/S (DK) | 2009-02-05 | — | — | US | disclosed |
| EP-1853321-A2 | INSULINOTROPIC AGENTS CONJUGATED WITH STRUCTURALLY WELL DEFINED BRANCHED POLYMERS | NOVO NORDISK A/S (DK) | 2007-11-14 | — | — | EP | disclosed |
| EP-1843790-A2 | INSULIN DERIVATIVES CONJUGATED WITH STRUCTURALLY WELL DEFINED BRANCHED POLYMERS | NOVO NORDISK A/S (DK) | 2007-10-17 | — | — | EP | disclosed |
| WO-2006087354-A2 | INSULINOTROPIC AGENTS CONJUGATED WITH STRUCTURALLY WELL DEFINED BRANCHED POLYMERS | NOVO NORDISK A/S (DK) | 2006-08-24 | — | — | WO | disclosed |
| WO-2006079641-A2 | INSULIN DERIVATIVES CONJUGATED WITH STRUCTURALLY WELL DEFINED BRANCHED POLYMERS | NOVO NORDISK A/S (DK) | 2006-08-03 | — | — | WO | disclosed |
| EP-0262086-B1 | CORROSION INHIBITOR | CIBA-GEIGY AG (CH) | 1992-01-02 | — | — | EP | disclosed |
| US-4877552-A | IMIDAZOLINE DERIVATIVES, TRIAZINE POLYACID, ALKANOLAMINE AND WATER | CIBA-GEIGY CORPORATION (US) | 1989-10-31 | — | — | US | disclosed |
| EP-0262086-A2 | Corrosion inhibitor | CIBA-GEIGY AG (CH) | 1988-03-30 | — | — | EP | disclosed |
| EP-0028351-B1 | REACTIVE DYESTUFFS AND THEIR USE IN DYEING MATERIALS CONTAINING OH OR NH | BAYER AG (DE) | 1984-02-22 | — | — | EP | disclosed |
| EP-0028351-A2 | Reactive dyestuffs and their use in dyeing materials containing OH or NH | BAYER AG (DE) | 1981-05-13 | — | — | EP | disclosed |