Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | S1PR3 | Q99500 | 2/20 | 0.69 |
| ▸ | WDR5 | P61964 | 3/20 | 0.53 |
| ▸ | ESR1 | P03372 | 7/20 | 0.51 |
| ▸ | THRA | P10827 | 1/20 | 0.51 |
| ▸ | THRB | P10828 | 1/20 | 0.51 |
| ▸ | S1PR2 | O95136 | 1/20 | 0.47 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.47 |
| ▸ | LPAR2 | Q9HBW0 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 2/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4527635 | 1.00 | S1PR3 (0.69) | S1PR3WDR5ESR1THRATHRB | |
| SCHEMBL4539139 | 1.00 | S1PR3 (0.69) | S1PR3WDR5ESR1THRATHRB | |
| SCHEMBL4530113 | 1.00 | S1PR3 (0.69) | S1PR3WDR5ESR1THRATHRB | |
| SCHEMBL4533583 | 1.00 | S1PR3 (0.69) | S1PR3WDR5ESR1THRATHRB | |
| SCHEMBL4522857 | 1.00 | S1PR3 (0.69) | S1PR3WDR5ESR1THRATHRB | |
| SCHEMBL4536045 | 1.00 | S1PR3 (0.69) | S1PR3WDR5ESR1THRATHRB | |
| SCHEMBL4527901 | 1.00 | S1PR3 (0.69) | S1PR3WDR5ESR1THRATHRB | |
| SCHEMBL4537948 | 1.00 | S1PR3 (0.69) | S1PR3WDR5ESR1THRATHRB | |
| SCHEMBL4532999 | 1.00 | S1PR3 (0.69) | S1PR3WDR5ESR1THRATHRB | |
| SCHEMBL4530018 | 1.00 | S1PR3 (0.69) | S1PR3WDR5ESR1THRATHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7534554-B2 | Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition | NEC ELECTRONICS CORPORATION (JP) | 2009-05-19 | — | — | US | disclosed |
| US-20080233518-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE WITH SUCH CHEMICALLY AMPLIFIED RESIST COMPOSITION | NEC ELECTRONICS CORPORATION (JP) | 2008-09-25 | — | — | US | disclosed |
| US-7396633-B2 | Damascene process; forming connectors; exposure; development; using acid generator, quencher and buffer | NEC ELECTRONICS CORPORATION (JP) | 2008-07-08 | — | — | US | disclosed |
| US-20040259029-A1 | Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition | NEC ELECTRONICS CORPORATION (JP) | 2004-12-23 | — | — | US | disclosed |