SCHEMBL4539626

SCHEMBL4539626

FC1=C(F)C(F)(C(F)(F)F)C1(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5428612 0.82
SCHEMBL6667496 0.80
SCHEMBL22217354 0.75
SCHEMBL7121737 0.73
SCHEMBL22217358 0.73
SCHEMBL6668205 0.71
SCHEMBL22217356 0.69
SCHEMBL333168 0.67
SCHEMBL6670456 0.65
SCHEMBL371498 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7479316-B2 Extruded binary seal DAYCO PRODUCTS, LLC (US) 2009-01-20 US claimed
EP-4088051-B1 CRANKCASE VENTILATION SYSTEM WITH A FLOW CONTROL DEVICE FOR ON BOARD DIAGNOSTICS DAYCO IP HOLDINGS LLC (US) 2025-02-19 EP disclosed
EP-3908740-B1 CRANKCASE VENTILATION SYSTEM WITH CONSTANT RESTRICTION IN THE FLOW DIRECTION AND FREE FLOW IN AN OPPOSITE DIRECTION DAYCO IP HOLDINGS LLC (US) 2024-09-18 EP disclosed
EP-3974408-B1 METHOD FOR SEPARATING DOUBLE-BOND-COMPRISING STRAIGHT-CHAIN HYDROCARBON IN WHICH ALL HYDROGEN ATOMS HAVE BEEN SUBSTITUTED WITH FLUORINE ATOMS OR CHLORINE ATOMS ZEON CORP (JP) 2024-06-26 EP disclosed
CN-114930062-B Crankcase ventilation system with flow control device for on-board diagnostics 戴科知识产权控股有限责任公司 2024-06-21 CN disclosed
CN-116783417-B Magnetic latching valve for fuel vapor management system and system including the same 戴科知识产权控股有限责任公司 2024-04-05 CN disclosed
US-11835018-B2 Magnetically latching valve for fuel vapor management systems and systems incorporating same DAYCO IP HOLDINGS, LLC (US) 2023-12-05 US disclosed
EP-4271923-A1 MAGNETICALLY LATCHING VALVE FOR FUEL VAPOR MANAGEMENT SYSTEMS AND SYSTEMS INCORPORATING SAME Dayco IP Holdings, LLC (US) 2023-11-08 EP disclosed
CN-116783417-A Magnetic latching valve for fuel vapor management system and system including the same 戴科知识产权控股有限责任公司 2023-09-19 CN disclosed
EP-4210985-A1 MAGNETICALLY LATCHING VALVE FOR FUEL VAPOR MANAGEMENT SYSTEMS AND SYSTEMS INCORPORATING SAME Dayco IP Holdings, LLC (US) 2023-07-19 EP disclosed
US-20220009858-A1 METHOD FOR PRODUCING HALOGENATED CYCLOALKANE COMPOUND DAIKIN INDUSTRIES, LTD. (JP) 2022-01-13 US disclosed
CN-113811522-A Process for separating straight-chain hydrocarbons having double bonds in which all hydrogen atoms are replaced by fluorine or chlorine atoms 日本瑞翁株式会社 2021-12-17 CN disclosed
WO-2020235425-A1 METHOD FOR SEPARATING DOUBLE-BOND-COMPRISING STRAIGHT-CHAIN HYDROCARBON IN WHICH ALL HYDROGEN ATOMS HAVE BEEN SUBSTITUTED WITH FLUORINE ATOMS OR CHLORINE ATOMS 日本ゼオン株式会社 (JP) 2020-11-26 WO disclosed
WO-2020195252-A1 METHOD FOR PRODUCING HALOGENATED CYCLOALKANE COMPOUND ダイキン工業株式会社 2020-10-01 WO disclosed
WO-2020145088-A1 METHOD FOR PRODUCING CYCLOBUTANE ダイキン工業株式会社 2020-07-16 WO disclosed
US-20070248769-A1 Cover film for organic electroluminescence devices, organic electroluminescence device using the cover film and process for producing the device TIS INTERNATIONAL, INC. 2007-10-25 US disclosed
US-20050019585-A1 comprises polymers of decomposition products of a perfluoroolefin (Perfluorocyclopentene); good transparency ZEON CORPORATION (JP) 2005-01-27 US disclosed
US-6383403-B1 USING OCTAFLUOROCYCLOPENTENE AND GENERATING A PLASMA USING INDUCTION OR HELICON WAVE SYSTEM TO ETCH SEMICONDUCTORS; HIGH ETCH SELECTIVITY; DOESN'T FORM POLYMER JAPAN AS REPRESENTED BY THE DIRECTOR GENERAL OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2002-05-07 US disclosed
EP-0964438-A1 DRY ETCHING METHOD Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) 1999-12-15 EP disclosed
EP-0948033-A1 GAS COMPOSITION FOR DRY ETCHING AND PROCESS OF DRY ETCHING Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) 1999-10-06 EP disclosed