⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11880724 | 0.82 | TSHR (0.33) | — | |
| SCHEMBL1973893 | 0.76 | — | — | |
| SCHEMBL25217085 | 0.76 | — | — | |
| SCHEMBL23551293 | 0.76 | — | — | |
| SCHEMBL10452 | 0.74 | — | — | |
| SCHEMBL268296 | 0.74 | — | — | |
| SCHEMBL19803311 | 0.73 | TSHR (0.44) | — | |
| SCHEMBL14204 | 0.70 | — | — | |
| SCHEMBL38309 | 0.70 | — | — | |
| SCHEMBL7181757 | 0.70 | TSHR (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4724505-A1 | NON-COORDINATED ALKYLALUMINUM FREE ANION MODIFIED ALUMOXANES AND METHODS THEREOF | ExxonMobil Technology and Engineering Company (US) | 2026-04-15 | — | — | EP | claimed |
| EP-4724507-A1 | SOLUTION CATALYST SYSTEMS AND USES THEREOF | ExxonMobil Technology and Engineering Company (US) | 2026-04-15 | — | — | EP | claimed |
| WO-2024253831-A1 | NON-COORDINATED ALKYLALUMINUM FREE ANION MODIFIED ALUMOXANES AND METHODS THEREOF | ExxonMobil Technology and Engineering Company (US) | 2024-12-12 | — | — | WO | claimed |
| WO-2024253829-A1 | SOLUTION CATALYST SYSTEMS AND USES THEREOF | ExxonMobil Technology and Engineering Company (US) | 2024-12-12 | — | — | WO | claimed |
| EP-4724507-A1 | SOLUTION CATALYST SYSTEMS AND USES THEREOF | ExxonMobil Technology and Engineering Company (US) | 2026-04-15 | — | — | EP | disclosed |
| EP-4724505-A1 | NON-COORDINATED ALKYLALUMINUM FREE ANION MODIFIED ALUMOXANES AND METHODS THEREOF | ExxonMobil Technology and Engineering Company (US) | 2026-04-15 | — | — | EP | disclosed |
| US-20260085408-A1 | SHIELDING COMPOUND, METHOD OF FORMING THIN FILM USING SHIELDING COMPOUND, AND SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR DEVICE FABRICATED USING METHOD | SOULBRAIN CO LTD (KR) | 2026-03-26 | — | — | US | disclosed |
| US-20250376765-A1 | FILM QUALITY IMPROVER, METHOD OF FORMING THIN FILM USING FILM QUALITY IMPROVER, SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD, AND SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR SUBSTRATE | SOULBRAIN CO LTD (KR) | 2025-12-11 | — | — | US | disclosed |
| CN-120077464-A | Masking compound, method for forming thin film using the same, semiconductor substrate manufactured thereby, and semiconductor device | 秀博瑞殷株式公社 | 2025-05-30 | — | — | CN | disclosed |
| US-20250019827-A1 | FILM QUALITY IMPROVER, METHOD OF FORMING THIN FILM USING FILM QUALITY IMPROVER, SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD, AND SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR SUBSTRATE | SOULBRAIN CO., LTD. (KR) | 2025-01-16 | — | — | US | disclosed |
| US-20250003067-A1 | FILM QUALITY IMPROVER, METHOD OF FORMING THIN FILM USING FILM QUALITY IMPROVER, AND SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD | SOULBRAIN CO., LTD. (KR) | 2025-01-02 | — | — | US | disclosed |
| WO-2024253831-A1 | NON-COORDINATED ALKYLALUMINUM FREE ANION MODIFIED ALUMOXANES AND METHODS THEREOF | ExxonMobil Technology and Engineering Company (US) | 2024-12-12 | — | — | WO | disclosed |
| WO-2024253829-A1 | SOLUTION CATALYST SYSTEMS AND USES THEREOF | ExxonMobil Technology and Engineering Company (US) | 2024-12-12 | — | — | WO | disclosed |
| CN-118234890-A | Film quality improver, method for forming thin film using same, semiconductor substrate manufactured thereby, and semiconductor device | 秀博瑞殷株式公社 | 2024-06-21 | — | — | CN | disclosed |
| CN-117941031-A | Film quality improver, method for forming thin film using same, and semiconductor substrate produced thereby | 秀博瑞殷株式公社 | 2024-04-26 | — | — | CN | disclosed |
| US-9150563-B2 | Nitrogen-containing aromatic heterocyclyl compound | DAIICHI SANKYO COMPANY, LIMITED (JP) | 2015-10-06 | — | — | US | disclosed |
| US-20140187592-A1 | NITROGEN-CONTAINING AROMATIC HETEROCYCLYL COMPOUND | DAIICHI SANKYO COMPANY, LIMITED (JP) | 2014-07-03 | — | — | US | disclosed |
| US-8648103-B2 | Nitrogen-containing aromatic heterocyclyl compound | DAIICHI SANKYO COMPANY, LIMITED (JP) | 2014-02-11 | — | — | US | disclosed |
| US-20120108639-A1 | NITROGEN-CONTAINING AROMATIC HETEROCYCLYL COMPOUND | DAIICHI SANKYO COMPANY, LIMITED (JP) | 2012-05-03 | — | — | US | disclosed |
| US-20100240560-A1 | ETHER COMPOSITION | ASAHI GLASS COMPANY, LIMITED (JP) | 2010-09-23 | — | — | US | disclosed |