SCHEMBL4548057

SCHEMBL4548057

C=NCN=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1960310 0.62
SCHEMBL1416539 0.62
SCHEMBL16900657 0.59
SCHEMBL11776166 0.59
SCHEMBL9605054 0.59
SCHEMBL19457042 0.59
SCHEMBL268403 0.59
SCHEMBL20384146 0.59
SCHEMBL13442812 0.59
SCHEMBL10028832 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160318857-A1 N,N'-Diarylurea Compounds and N,N'-Diarylthiourea Compounds as Inhibitors of Translation Initiation PRESIDENT AND FELLOWS OF HARVARD COLLEGE 2016-11-03 US disclosed
US-9421211-B2 N,N′-diarylurea compounds and N,N′-diarylthiourea compounds as inhibitors of translation initiation PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2016-08-23 US disclosed
US-20160060337-A1 METHODS FOR TREATING PSORIASIS USING AN ANTI-IL-23 ANTIBODY AMGEN INC. 2016-03-03 US disclosed
US-20150259566-A1 METHODS FOR PROVIDING A LOW GLOSS POLYURETHANE COATING ON A SUBSTRATE BAYER MATERIALSCIENCE LLC (US) 2015-09-17 US disclosed
US-20150034161-A1 ORGANIC SEMICONDUCTING COMPOUNDS FOR USE IN ORGANIC ELECTRONIC DEVICES NEXT ENERGY TECHNOLOGIES, INC. 2015-02-05 US disclosed
US-20120115915-A1 N,N'-DIARYLUREA COMPOUNDS AND N,N'-DIARYLTHIOUREA COMPOUNDS AS INHIBITORS OF TRANSLATION INITIATION PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2012-05-10 US disclosed
US-7172855-B2 Silver halide photographic light-sensitive material and package thereof FUJI PHOTO FILM CO., LTD. (JP) 2007-02-06 US disclosed