⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4969030 | 1.00 | — | — | |
| SCHEMBL4969038 | 1.00 | — | — | |
| SCHEMBL5489375 | 0.96 | — | — | |
| SCHEMBL5489373 | 0.96 | — | — | |
| SCHEMBL23170009 | 0.86 | — | — | |
| SCHEMBL14946733 | 0.86 | — | — | |
| SCHEMBL24070452 | 0.86 | — | — | |
| SCHEMBL15433917 | 0.81 | — | — | |
| SCHEMBL13187093 | 0.81 | — | — | |
| SCHEMBL10057929 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10253408-B2 | Compound, thin film-forming material, and thin film manufacturing method | ADEKA CORPORATION (JP) | 2019-04-09 | — | — | US | disclosed |
| EP-3312187-A1 | METHOD FOR MANUFACTURING NOVEL COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION, AND THIN FILM | Adeka Corporation (JP) | 2018-04-25 | — | — | EP | disclosed |
| US-20180051372-A1 | NOVEL COMPOUND, THIN FILM-FORMING MATERIAL, AND THIN FILM MANUFACTURING METHOD | ADEKA CORPORATION (JP) | 2018-02-22 | — | — | US | disclosed |
| US-20180051372-A1 | NOVEL COMPOUND, THIN FILM-FORMING MATERIAL, AND THIN FILM MANUFACTURING METHOD | ADEKA CORPORATION (JP) | 2018-02-22 | — | — | US | disclosed |
| US-9371452-B2 | Film-forming material, group IV metal oxide film and vinylenediamide complex | TOSOH CORPORATION (JP) | 2016-06-21 | — | — | US | disclosed |
| US-9219232-B2 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | ENTEGRIS, INC. (US) | 2015-12-22 | — | — | US | disclosed |
| US-9120825-B2 | Hydrosilane derivative, method for producing same, and method for producing silicon-containing thin film | TOSOH CORPORATION (JP) | 2015-09-01 | — | — | US | disclosed |
| US-20140227456-A1 | FILM-FORMING MATERIAL, GROUP IV METAL OXIDE FILM AND VINYLENEDIAMIDE COMPLEX | SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) | 2014-08-14 | — | — | US | disclosed |
| US-20140220733-A1 | ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN FILMS | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2014-08-07 | — | — | US | disclosed |
| US-8709863-B2 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2014-04-29 | — | — | US | disclosed |
| US-8093140-B2 | Amorphous Ge/Te deposition process | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2012-01-10 | — | — | US | disclosed |
| US-20110263100-A1 | ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN FILMS | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2011-10-27 | — | — | US | disclosed |
| US-8008117-B2 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2011-08-30 | — | — | US | disclosed |
| US-20110071141-A1 | Pesticidial Condensed-Ring Aryl Compounds | BAYER CROPSCIENCE AG | 2011-03-24 | — | — | US | disclosed |
| US-20100317150-A1 | ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN FILMS | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2010-12-16 | — | — | US | disclosed |
| US-7838329-B2 | precursor mixture comprising germanium bis(n-butyl, N,N-diisopropylamidinate, and solvent; chemical vapor depositing a germanium-antimony-tellurium (GST) films; microelectronic devices; infrared detectors | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2010-11-23 | — | — | US | disclosed |
| WO-2010008065-A1 | METHOD FOR MANUFACTURING SUBSTITUTED ETHYNYL GOLD-NITROGEN CONTAINING HETEROCYCLIC CARBENE COMPLEX | 宇部興産株式会社 (JP) | 2010-01-21 | — | — | WO | disclosed |
| US-20090305458-A1 | precursor mixture comprising germanium bis(n-butyl, N,N-diisopropylamidinate, and solvent; chemical vapor depositing a germanium-antimony-tellurium (GST) films; microelectronic devices; infrared detectors | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2009-12-10 | — | — | US | disclosed |
| EP-2088151-A1 | GOLD COMPLEX, METHOD FOR PRODUCTION OF THE GOLD COMPLEX, AND ORGANIC ULTRAVIOLET ELECTROLUMINESCENT ELEMENT USING THE GOLD COMPLEX | Ube Industries, Ltd. (JP) | 2009-08-12 | — | — | EP | disclosed |
| US-20090112009-A1 | AMORPHOUS GE/TE DEPOSITION PROCESS | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2009-04-30 | — | — | US | disclosed |