SCHEMBL455035

SCHEMBL455035

C/C(=C\C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(C)F)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6440592 1.00
SCHEMBL455672 1.00
SCHEMBL6440588 1.00
SCHEMBL848223 1.00
SCHEMBL725585 1.00
SCHEMBL3417523 0.85
SCHEMBL3417525 0.85
SCHEMBL5193769 0.81
SCHEMBL9446214 0.80 KDM4E (0.33)
SCHEMBL14861338 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020225822-A1 AQUEOUS POLYMER COMPOSITION ASIAN PAINTS LIMITED (IN) 2020-11-12 WO disclosed
US-9604891-B2 Methods for producing fluorine-containing hydroxyaldehyde, fluorine-containing propanediol, and fluorine-containing alcohol monomer CENTRAL GLASS COMPANY, LIMITED (JP) 2017-03-28 US disclosed
US-9488914-B2 Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same CENTRAL GLASS COMPANY, LIMITED (JP) 2016-11-08 US disclosed
US-20150361026-A1 Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer CENTRAL GLASS COMPANY, LIMITED (JP) 2015-12-17 US disclosed
US-20150198879-A1 Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2015-07-16 US disclosed
US-8663903-B2 Top coating composition CENTRAL GLASS COMPANY, LIMITED (JP) 2014-03-04 US disclosed
US-20130216960-A1 Water Repellent Additive for Immersion Resist CENTRAL GLASS COMPANY, LIMITED (JP) 2013-08-22 US disclosed
EP-2432820-A2 TERMINALLY UNSATURATED, OXETANE-BASED MACROMONOMERS, AND METHOD FOR THE PRODUCTION THEREOF BYK-Chemie GmbH (DE) 2012-03-28 EP disclosed
EP-2432819-A2 POLYMERS OBTAINABLE FROM OXETANE BASED MACROMONOMERS, METHOD FOR THE PRODUCTION THEREOF, AND THE USE THEREOF AS ADDITIVES IN COATING AGENTS AND PLASTICS BYK-Chemie GmbH (DE) 2012-03-28 EP disclosed
US-20120064459-A1 Water Repellent Additive for Immersion Resist CENTRAL GLASS COMPANY, LIMITED (JP) 2012-03-15 US disclosed
US-20050250898-A1 Top coat composition CENTRAL GLASS COMPANY, LIMITED (JP) 2005-11-10 US disclosed
EP-1368679-A4 FUNCTIONAL MATERIALS FOR USE IN OPTICAL SYSTEMS BATTELLE MEMORIAL INSTITUTE (US) 2005-08-31 EP disclosed
US-20050159623-A1 Electrooptic compounds and methods for making MCGINNISS VINCENT D (US) 2005-07-21 US disclosed
US-20050040377-A1 Functional materials for use in optical systems DROTLEFF ELIZABETH (US) 2005-02-24 US disclosed
WO-2005007762-A1 POLYURETHANE-POLYMER HYBRID DISPERSION WITH ENHANCED SURFACE PROPERTIES, METHOD FOR THE PRODUCTION AND UTILIZATION THEREOF CONSTRUCTION RESEARCH & TECHNOLOGY GMBH (DE) 2005-01-27 WO disclosed
EP-1368679-A1 FUNCTIONAL MATERIALS FOR USE IN OPTICAL SYSTEMS BATTELLE MEMORIAL INSTITUTE (US) 2003-12-10 EP disclosed
US-6610219-B2 Including polymer systems and electrooptical chromophores, wherein the Polymer are thermoplastic and/or thermosetting polymers and are blened or copolymerized with electropotical chromophores BATTELLE MEMORIAL INSTITUTE 2003-08-26 US disclosed
US-20020185633-A1 Functional materials for use in optical systems BATTELLE MEMORIAL INSTITUTE 2002-12-12 US disclosed
WO-2002069002-A1 FUNCTIONAL MATERIALS FOR USE IN OPTICAL SYSTEMS BATTELLE MEMORIAL INSTITUTE (US) 2002-09-06 WO disclosed
US-4871785-A CROSSLINKED POLYOXYETHYLENE GLYCOL FROIX MICHAEL (US) 1989-10-03 US disclosed