SCHEMBL4559467

SCHEMBL4559467

CCC1CC(=O)N1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5768296 1.00
SCHEMBL14314366 1.00
SCHEMBL8252569 0.86 CREBBP (0.58)
SCHEMBL1114540 0.81
SCHEMBL1114445 0.81
SCHEMBL16268146 0.81 BRD4 (0.44)
SCHEMBL22753505 0.81 BRD4 (0.45)
Hydrochloric Acid SCHEMBL1114698 0.79
SCHEMBL20594572 0.79
SCHEMBL17680224 0.77 CREBBP (1.00)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4551655-A1 COMPOSITION COMPRISING A CYCLIC AMIDE BYK-Chemie GmbH (DE) 2025-05-14 EP claimed
EP-3053972-B1 PENETRANT LIQUID FOR INK JET TEXTILE PRINTING SEIKO EPSON CORP (JP) 2024-08-21 EP claimed
WO-2024008765-A1 COMPOSITION COMPRISING A CYCLIC AMIDE BYK-CHEMIE GMBH (DE) 2024-01-11 WO claimed
US-11499063-B2 Ink jet textile printing ink composition and recording method SEIKO EPSON CORPORATION 2022-11-15 US claimed
EP-3693414-A1 INK JET TEXTILE PRINTING INK COMPOSITION AND RECORDING METHOD Seiko Epson Corporation (JP) 2020-08-12 EP claimed
CN-111500117-A Ink composition for ink jet printing and recording method 精工爱普生株式会社 2020-08-07 CN claimed
US-20200248020-A1 INK JET TEXTILE PRINTING INK COMPOSITION AND RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2020-08-06 US claimed
US-20160230334-A1 PENETRANT LIQUID FOR INK JET TEXTILE PRINTING SEIKO EPSON CORPORATION (JP) 2016-08-11 US claimed
EP-3053972-A1 PENETRANT LIQUID FOR INK JET TEXTILE PRINTING Seiko Epson Corporation (JP) 2016-08-10 EP claimed
US-5338861-A Cleaving lactam N-carboxylate or lactim O-carboxylate with elimination of carbon dioxide by heating in gas or liquid phase BAYER AKTIENGESELLSCHAFT (DE) 1994-08-16 US claimed
EP-4626968-A1 BINDER COMPOSITIONS AND USE THEREOF Nilo Limited (NZ) 2025-10-08 EP disclosed
EP-4615896-A1 SCRATCH RESISTANT ONE-PACK COATING MATERIAL BASF Coatings GmbH (DE) 2025-09-17 EP disclosed
EP-4594424-A1 THERMOPLASTIC MOULDING COMPOSITIONS HAVING AN IMPROVED COLOUR STABILITY-2 BASF SE (DE) 2025-08-06 EP disclosed
WO-2025049458-A1 FLUID RESISTANT TREATMENT AND GARMENTS TREATED THEREWITH BURLINGTON INDUSTRIES LLC (US) 2025-03-06 WO disclosed
WO-2025049447-A1 FLUID RESISTANT TREATMENT AND GARMENTS TREATED THEREWITH BURLINGTON INDUSTRIES LLC (US) 2025-03-06 WO disclosed
US-20040006062-A1 Sulfonylaminovalerolactams and derivatives thereof as factor Xa inhibitors BRISTOL-MYERS SQUIBB COMPANY 2004-01-08 US disclosed
EP-0531673-B1 Process for the preparation of N-substituted lactams BAYER AG (DE) 1996-09-11 EP disclosed
US-5338861-A Cleaving lactam N-carboxylate or lactim O-carboxylate with elimination of carbon dioxide by heating in gas or liquid phase BAYER AKTIENGESELLSCHAFT (DE) 1994-08-16 US disclosed
EP-0531673-A1 Process for the preparation of N-substituted lactams BAYER AG (DE) 1993-03-17 EP disclosed
US-4421844-A COMPOUND WHICH SPLITS OFF ACID AND CLEAVABLE ETHER COMPOUND HOECHST AKTIENGESELLSCHAFT (DE) 1983-12-20 US disclosed