⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL167844 | 0.77 | — | — | |
| SCHEMBL5377012 | 0.77 | — | — | |
| SCHEMBL176319 | 0.73 | — | — | |
| SCHEMBL11375778 | 0.71 | — | — | |
| SCHEMBL9693350 | 0.69 | — | — | |
| SCHEMBL28319850 | 0.69 | — | — | |
| SCHEMBL7079296 | 0.69 | — | — | |
| SCHEMBL4939824 | 0.69 | — | — | |
| SCHEMBL278363 | 0.67 | — | — | |
| SCHEMBL9683531 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-56141807-A | — | — | None | — | — | JP | disclosed |
| CN-106687198-B | Hygroscopic material and the dehumidifier for using the hygroscopic material | 夏普株式会社 | 2019-08-16 | — | — | CN | disclosed |
| EP-1580606-B1 | RINSE LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING RESIST PATTERN USING SAME | AZ ELECTRONIC MATERIALS USA (US) | 2012-07-25 | — | — | EP | disclosed |
| US-20090317752-A1 | Rinse liquid for lithography and method for forming resist pattern using same | KOBAYASHI MASAKAZU | 2009-12-24 | — | — | US | disclosed |
| US-20060124586-A1 | Rinse liquid for lithography and method for forming resist pattern using same | KOBAYASHI MASAKAZU | 2006-06-15 | — | — | US | disclosed |
| EP-1580606-A1 | RINSE LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING RESIST PATTERN USING SAME | AZ Electronic Materials (Japan) K.K. (JP) | 2005-09-28 | — | — | EP | disclosed |
| US-5173521-A | Polyelectrolyte complexes of cmc salts with cationic water-soluble nitrogen polymers; water absorbency, wet-web strength | MISHIMA PAPER CO., LTD. (JP) | 1992-12-22 | — | — | US | disclosed |
| US-4614827-A | SPRAY DRYING | ROHM GMBH (DE) | 1986-09-30 | — | — | US | disclosed |
| JP-S56141807-A | CATIONIC ORGANIC POLYMER FLOCCULANT | KURITA WATER IND LTD | 1981-11-05 | — | — | JP | disclosed |