⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6466824 | 0.76 | — | — | |
| SCHEMBL6151061 | 0.73 | — | — | |
| SCHEMBL6150909 | 0.73 | — | — | |
| SCHEMBL7632286 | 0.72 | — | — | |
| SCHEMBL6151293 | 0.72 | — | — | |
| SCHEMBL6151170 | 0.69 | — | — | |
| SCHEMBL8060016 | 0.65 | — | — | |
| SCHEMBL6465756 | 0.65 | — | — | |
| SCHEMBL6151848 | 0.62 | — | — | |
| SCHEMBL6151239 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1006374-B1 | Process for producing a resin having a large refractive index | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-01-07 | — | — | EP | disclosed |
| EP-1046931-B1 | Composition for optical materials | MITSUBISHI GAS CHEMICAL CO (JP) | 2006-06-21 | — | — | EP | disclosed |
| EP-1120667-B1 | Process for production of optical material | MITSUBISHI GAS CHEMICAL CO (JP) | 2005-06-22 | — | — | EP | disclosed |
| EP-1099721-B1 | Composition for producing resin | MITSUBISHI GAS CHEMICAL CO (JP) | 2005-01-12 | — | — | EP | disclosed |
| US-6534589-B1 | Catalytic curing and polymerization of episulfide compound in presence of phenolic compound | MITSUBISHI GAS CHEMICAL COMPANY INC. (JP) | 2003-03-18 | — | — | US | disclosed |
| US-6531532-B1 | Optical apparatus formed by curing sulfides, intermetallics and 1,2-bis/-epithiopropylthio/ethane to form lenses having large refractive index and optical distortion | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-03-11 | — | — | US | disclosed |
| US-6472495-B1 | RESIN PRODUCED BY CURING THE COMPOSITION BY POLYMERIZATION HAS AN EXCELLENT IMPACT RESISTANCE AND OPTICAL PROPERTIES, AND IS SUITABLE AS AN OPTICAL MATERIAL. POLYMERS WITH SULFIDE, SELINIUM AND TELLURIUM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-10-29 | — | — | US | disclosed |
| US-6444146-B2 | DISCOLORATION INHIBITION | MITSUBISHI GAS CHEMICAL CO. (JP) | 2002-09-03 | — | — | US | disclosed |
| EP-1120667-A2 | Process for production of optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-08-01 | — | — | EP | disclosed |
| US-20010008278-A1 | Process for production of optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) | 2001-07-19 | — | — | US | disclosed |
| EP-1099721-A1 | Composition for producing resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-05-16 | — | — | EP | disclosed |
| EP-1046931-A2 | Composition for optical materials | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-10-25 | — | — | EP | disclosed |
| EP-1006374-A2 | Process for producing a resin having a large refractive index | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-06-07 | — | — | EP | disclosed |