Known targets — ChEMBL curated mechanism
ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL160140 | 0.87 | — | — | |
| Iodomethane SCHEMBL14086829 | 0.87 | — | — | |
| SCHEMBL8998842 | 0.75 | — | — | |
| Hydrochloric Acid SCHEMBL301373 | 0.75 | — | — | |
| SCHEMBL1232524 | 0.75 | — | — | |
| SCHEMBL6861514 | 0.75 | — | — | |
| Fluoride Ion SCHEMBL21352339 | 0.75 | — | — | |
| Bromide SCHEMBL1031308 | 0.50 | — | — | |
| Bromide SCHEMBL11758218 | 0.50 | — | — | |
| Bromide SCHEMBL3617814 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-100509821-C | Method for depositing film of IIIA group metal | ROHM & HAAS ELECT MAT (US) | 2009-07-08 | — | — | CN | disclosed |
| US-7390360-B2 | Organometallic compounds | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-06-24 | — | — | US | disclosed |
| US-20060115595-A1 | Organometallic compounds | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-06-01 | — | — | US | disclosed |
| CN-1769288-A | Organometallic compounds suitable for use in vapor deposition processes | ROHM & HAAS ELECT MAT (US) | 2006-05-10 | — | — | CN | disclosed |
| EP-1645656-A1 | Organometallic compounds suitable for use in vapor deposition processes | Rohm and Haas Electronic Materials, L.L.C. (US) | 2006-04-12 | — | — | EP | disclosed |