SCHEMBL4586172

SCHEMBL4586172

CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)O[Ti](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20513477 0.95
SCHEMBL20513234 0.79
SCHEMBL20513222 0.79
SCHEMBL20513457 0.75
SCHEMBL20513421 0.73
SCHEMBL20514094 0.73
SCHEMBL20513902 0.73
SCHEMBL20513171 0.73
SCHEMBL20513322 0.73
SCHEMBL20513270 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1523763-A4 MOLECULAR LAYER DEPOSITION OF THIN FILMS WITH MIXED COMPONENTS AVIZA TECH INC (US) 2008-12-24 EP claimed
EP-1523763-A2 MOLECULAR LAYER DEPOSITION OF THIN FILMS WITH MIXED COMPONENTS Aviza Technology, Inc. (US) 2005-04-20 EP claimed
WO-2004010469-A2 ATOMIC LAYER DEPOSITION OF MULTI-METALLIC PRECURSORS AVIZA TECHNOLOGY, INC. (US) 2004-01-29 WO claimed
US-11795064-B2 Polymetalloxane, method for producing same, composition thereof, cured film and method for producing same, and members and electronic components provided with same TORAY INDUSTRIES, INC. (JP) 2023-10-24 US disclosed
EP-3381969-B1 POLYMETALLOXANE, METHOD FOR PRODUCING SAME, COMPOSITION THEREOF, CURED FILM AND METHOD FOR PRODUCING SAME, AND MEMBERS AND ELECTRONIC COMPONENTS PROVIDED WITH SAME TORAY INDUSTRIES (JP) 2020-06-03 EP disclosed
US-20180327275-A1 POLYMETALLOXANE, METHOD FOR PRODUCING SAME, COMPOSITION THEREOF, CURED FILM AND METHOD FOR PRODUCING SAME, AND MEMBERS AND ELECTRONIC COMPONENTS PROVIDED WITH SAME TORAY INDUSTRIES, INC. (JP) 2018-11-15 US disclosed
EP-3381969-A1 POLYMETALLOXANE, METHOD FOR PRODUCING SAME, COMPOSITION THEREOF, CURED FILM AND METHOD FOR PRODUCING SAME, AND MEMBERS AND ELECTRONIC COMPONENTS PROVIDED WITH SAME Toray Industries, Inc. (JP) 2018-10-03 EP disclosed
EP-1523763-A4 MOLECULAR LAYER DEPOSITION OF THIN FILMS WITH MIXED COMPONENTS AVIZA TECH INC (US) 2008-12-24 EP disclosed
EP-1523763-A2 MOLECULAR LAYER DEPOSITION OF THIN FILMS WITH MIXED COMPONENTS Aviza Technology, Inc. (US) 2005-04-20 EP disclosed
WO-2004010469-A2 ATOMIC LAYER DEPOSITION OF MULTI-METALLIC PRECURSORS AVIZA TECHNOLOGY, INC. (US) 2004-01-29 WO disclosed
EP-0691313-B1 Precursor for producing SiO2TiO2 FORD MOTOR CO (US) 1999-05-19 EP disclosed
US-5536857-A TRI-TERT-BUTOXYSILYLOXYTITANIUM TRI-TERT-BUTOXIDE FORD MOTOR COMPANY (US) 1996-07-16 US disclosed
EP-0691313-A1 Precursor for producing SiO2TiO2 Ford Motor Company (US) 1996-01-10 EP disclosed