SCHEMBL4587444

SCHEMBL4587444

C[Si](C)(C)OC(CCO)(O[Si](C)(C)C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4586136 0.77
SCHEMBL4587475 0.76
SCHEMBL6645696 0.76
SCHEMBL942903 0.72
SCHEMBL8764550 0.72
SCHEMBL3625975 0.69
SCHEMBL5918617 0.67
SCHEMBL20536810 0.67
SCHEMBL4615193 0.65
SCHEMBL945869 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1509814-A4 ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF FUJIFILM ELECTRONIC MATERIALS (US) 2008-08-27 EP disclosed
EP-1509814-A2 ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF Arch Specialty Chemicals, Inc. (US) 2005-03-02 EP disclosed
US-6830870-B2 Mixtures of addition copolymers, acid generators and solvents, used as photosensitive coatings in lithography; relief images ARCH SPECIALITY CHEMICALS, INC. 2004-12-14 US disclosed
US-20040034160-A1 Acetal protected polymers and photoresists compositions thereof ARCH SPECIALITY CHEMICALS, INC. 2004-02-19 US disclosed
WO-2003099782-A2 ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF ARCH SPECIALTY CHEMICALS, INC. (US) 2003-12-04 WO disclosed